Patents by Inventor Thorsten Lehmann

Thorsten Lehmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12655136
    Abstract: The present invention relates to substituted dioxane derivatives, pharmaceutical compositions containing them and their use in therapy, particularly in the treatment and/or prevention of neuronal and non-neuronal conditions having an association with mGluR4 function and/or in the treatment of obesity by means of mGluR4 modulation.
    Type: Grant
    Filed: October 27, 2023
    Date of Patent: June 16, 2026
    Assignee: Boehringer Ingelheim International GmbH
    Inventors: Roland Pfau, Georg Dahmann, Johann Faustus Du Hoffmann, Kai Gerlach, Riccardo Giovannini, Christoph Hohn, Stefan Just, Thorsten Lehmann, Anton Pekcec, Julia Schlichtiger, Heiko Sommer, Christian Specker
  • Patent number: 12421218
    Abstract: The present invention relates to compounds of formula I a process for their manufacture, pharmaceutical compositions containing them and their use in therapy, particularly in the treatment and/or prevention of conditions having an association with the function of metabotropic glutamate receptor subtype 4 (mGluR4). A, R1, R2, R3, R4, R5 and R6 have meanings given in the description.
    Type: Grant
    Filed: August 14, 2024
    Date of Patent: September 23, 2025
    Assignee: Boehringer Ingelheim International GmbH
    Inventors: Roland Pfau, Georg Dahmann, Johann Faustus Du Hoffmann, Kai Gerlach, Riccardo Giovaninni, Christoph Hohn, Stefan Just, Thorsten Lehmann, Anton Pekcec, Stefan Peters, Julia Schlichtiger, Heiko Sommer, Christian Specker, Dieter Wiedenmayer
  • Publication number: 20240417394
    Abstract: The present invention relates to compounds of formula I a process for their manufacture, pharmaceutical compositions containing them and their use in therapy, particularly in the treatment and/or prevention of conditions having an association with the function of metabotropic glutamate receptor subtype 4 (mGluR4). A, R1, R2, R3, R4, R5 and R6 have meanings given in the description.
    Type: Application
    Filed: August 14, 2024
    Publication date: December 19, 2024
    Inventors: Roland PFAU, Georg DAHMANN, Johann Faustus DU HOFFMANN, Kai GERLACH, Riccardo GIOVANINNI, Christoph HOHN, Stefan JUST, Thorsten LEHMANN, Anton PEKCEC, Stefan PETERS, Julia SCHLICHTIGER, Heiko SOMMER, Christian SPECKER, Dieter WIEDENMAYER
  • Publication number: 20240182453
    Abstract: The present invention relates to compounds of formula I a process for their manufacture, pharmaceutical compositions containing them and their use in therapy, particularly in the treatment and/or prevention of conditions having an association with the function of metabotropic glutamate receptor subtype 4 (mGluR4). A, R1, R2, R3, R4, R5 and R6 have meanings given in the description.
    Type: Application
    Filed: October 27, 2023
    Publication date: June 6, 2024
    Inventors: Roland PFAU, Georg DAHMANN, Johann Faustus DU HOFFMANN, Kai GERLACH, Riccardo GIOVANINNI, Christoph HOHN, Stefan JUST, Thorsten LEHMANN, Anton PEKCEC, Stefan PETERS, Julia SCHLICHTIGER, Heiko SOMMER, Christian SPECKER, Dieter WIEDENMAYER
  • Publication number: 20240174652
    Abstract: The present invention relates to substituted dioxane derivatives, pharmaceutical compositions containing them and their use in therapy, particularly in the treatment and/or prevention of neuronal and non-neuronal conditions having an association with mGluR4 function and/or in the treatment of obesity by means of mGluR4 modulation.
    Type: Application
    Filed: October 27, 2023
    Publication date: May 30, 2024
    Inventors: Roland PFAU, Georg DAHMANN, Johann Faustus DU HOFFMANN, Kai GERLACH, Riccardo GIOVANNINI, Christoph HOHN, Stefan JUST, Thorsten LEHMANN, Anton PEKCEC, Julia SCHLICHTIGER, Heiko SOMMER, Christian SPECKER
  • Publication number: 20100099266
    Abstract: Embodiments of the invention provide a method and apparatus that enables plasma etching of high aspect ratio features. In one embodiment, a method for etching is provided that includes providing a substrate having a patterned mask disposed on a silicon layer in an etch reactor, providing a gas mixture of the reactor, maintaining a plasma formed from the gas mixture, wherein bias power and RF power provided the reactor are pulsed, and etching the silicon layer in the presence of the plasma.
    Type: Application
    Filed: September 21, 2009
    Publication date: April 22, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Manfred Oswald, Jivko Dinev, Jan Rupf, Markus Meye, Francesco Maletta, Uwe Leucke, Ron Tilger, Farid Abooameri, Alexander Matyushkin, Denis Koosau, Xiaoping Zhou, Thorsten Lehmann, Declan Scanlan