Patents by Inventor Thuc M. Dinh

Thuc M. Dinh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130036973
    Abstract: The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.
    Type: Application
    Filed: September 5, 2012
    Publication date: February 14, 2013
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Thuc M. Dinh, William D. Dick, Aaron M. Collins, Francisco J. Romay
  • Publication number: 20110192909
    Abstract: The present disclosure relates to an apparatus and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus includes a mechanism to control the rate of liquid flow through the apparatus, the mechanism including a piezoelectric actuator to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to faun droplets suitable for vaporization and subsequent thin film deposition on a substrate.
    Type: Application
    Filed: February 1, 2011
    Publication date: August 11, 2011
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Thuc M. Dinh, Yamin Ma
  • Publication number: 20110091649
    Abstract: The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.
    Type: Application
    Filed: August 31, 2010
    Publication date: April 21, 2011
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Thuc M. Dinh, William D. Dick, Aaron M. Collins, Francisco J. Romay
  • Publication number: 20090084315
    Abstract: This disclosure pertains to a method and apparatus to permit changing a filter on the input line to a vacuum deposition chamber without breaking or reducing the vacuum for the deposition chamber and other components in the deposition system. Isolation valves are provided at the inlet and outlet of the filter so the filter can be isolated from the source of vacuum and the deposition chamber for removal and replacement of the filter.
    Type: Application
    Filed: September 22, 2008
    Publication date: April 2, 2009
    Applicant: MSP Corporation
    Inventors: Benjamin Y.H. Liu, Yamin Ma, Thuc M. Dinh