Patents by Inventor Tian-Yeu WU

Tian-Yeu WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low magnetic chemical mechanical polishing conditioner
    Patent number: 9475171
    Abstract: The present invention relates to a low magnetic chemical mechanical polishing conditioner and a method for producing the same. The method comprises: providing a substrate; providing a bonding layer disposed on the substrate; and providing a plurality of abrasive particles placed on the bonding layer, and the abrasive particles are placed on the substrate by the bonding layer; wherein the abrasive particles are screened into a non-magnetic content or a low magnetic content through a magnetic separation device. Therefore, the abrasive particles used in the low magnetic chemical mechanical polishing conditioner of the present invention are non-magnetic abrasive particles perfectly to avoid influence of polishing performance due to magnetic abrasive particles.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: October 25, 2016
    Assignee: KINIK COMPANY
    Inventor: Tian-Yeu Wu
  • Low Magnetic Chemical Mechanical Polishing Conditioner
    Publication number: 20150174730
    Abstract: The present invention relates to a low magnetic chemical mechanical polishing conditioner, comprising a substrate; a bonding layer disposed on the substrate; and a plurality of abrasive particles placed on the bonding layer, and the abrasive particles are placed on the substrate by the bonding layer; wherein the abrasive particles are screened into a non-magnetic content and a low magnetic content through a magnetic separation device. Therefore, the abrasive particles used in the low magnetic chemical mechanical polishing conditioner of the present invention are non-magnetic abrasive particles perfectly to avoid influence of polishing performance due to magnetic abrasive particles.
    Type: Application
    Filed: December 4, 2014
    Publication date: June 25, 2015
    Inventor: Tian-Yeu WU