Patents by Inventor Tianlong Wen

Tianlong Wen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern transfer with self-assembled nanoparticle assemblies
    Patent number: 9487869
    Abstract: In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: November 8, 2016
    Assignee: Carnegie Mellon University
    Inventors: Sara Majetich, Tianlong Wen
  • Pattern Transfer With Self-assembled Nanoparticle Assemblies
    Publication number: 20130327636
    Abstract: In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
    Type: Application
    Filed: May 31, 2013
    Publication date: December 12, 2013
    Applicant: Carnegie Mellon University
    Inventors: Sara Majetich, Tianlong Wen