Patents by Inventor Tianyou GAO

Tianyou GAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing an array substrate, array substrate and display device
    Patent number: 10304876
    Abstract: This disclosure relates to the field of display technologies, and discloses a method for manufacturing an array substrate, an array substrate, a grayscale mask plate and a display device. The method includes forming a transparent conductive layer and a metal layer sequentially on a base substrate. A photoresist pattern is formed on the base: substrate on which the transparent conductive layer and the metal layer have been formed The transparent conductive layer and the metal layer corresponding to a photoresist-free region are removed. The photoresist in a second photoresist region is removed. The metal layer corresponding to the second photoresist region is removed to expose a pixel electrode. Additionally, the photoresist in a first photoresist region is removed to expose a first electrode, a second electrode and a first data line.
    Type: Grant
    Filed: May 31, 2016
    Date of Patent: May 28, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Yiping Dong, Lei Zhang, Tianyou Gao
  • METHOD FOR MANUFACTURING AN ARRAY SUBSTRATE, ARRAY SUBSTRATE, GRAYSCALE MASK PLATE AND DISPLAY DEVICE
    Publication number: 20180175081
    Abstract: This disclosure relates to the field of display technologies, and discloses a method for manufacturing an array substrate, an array substrate, a grayscale mask plate and a display device. The method includes forming a transparent conductive layer and a metal layer sequentially on a base substrate. A photoresist pattern is formed on the base: substrate on which the transparent conductive layer and the metal layer have been formed The transparent conductive layer and the metal layer corresponding to a photoresist-free region are removed. The photoresist in a second photoresist region is removed. The metal layer corresponding to the second photoresist region is removed to expose a pixel electrode. Additionally, the photoresist in a first photoresist region is removed to expose a first electrode, a second electrode and a first data line.
    Type: Application
    Filed: May 31, 2016
    Publication date: June 21, 2018
    Inventors: Yiping DONG, Lei ZHANG, Tianyou GAO