Abstract: A semiconductor device includes a first semiconductor component, a second semiconductor component, and a damage detection structure. The first semiconductor component includes a first edge region. The second semiconductor component is stacked below the first semiconductor component and includes a second edge region. The damage detection structure includes a plurality of first conductive paths and a plurality of second conductive paths. The first conductive paths are disposed in the first edge region. The second conductive paths are disposed in the second edge region and are electrically coupled to the first conductive paths.

Abstract: A semiconductor die includes a substrate comprising an integrated circuit region thereon, a front end of line (FEOL) portion disposed on a front side of the substrate, a back end of line (BEOL) portion disposed on the FEOL portion, a power delivery network (PDN) portion disposed on a back side of the substrate, and a plurality of through substrate vias penetrating through the substrate and disposed along a perimeter of the integrated circuit region. The BEOL portion includes a first discontinuous ring disposed along the perimeter of the integrated circuit region. The PDN portion includes a second discontinuous ring disposed along the perimeter of the integrated circuit region. The first discontinuous ring is interlaced with the second discontinuous ring through the plurality of through substrate vias, thereby constituting a die damage ring.

Abstract: A semiconductor device includes an application processor (AP) die and a memory die directly bonded to the AP die. The memory die includes a substrate, a non-volatile memory structure on the substrate, and at least one trench capacitor in the substrate.

Abstract: A semiconductor package includes a first substrate, a second substrate, a conductive component, an electronic component and a passive component. The conductive component is disposed between the first substrate and the second substrate, wherein the first substrate and the second substrate are separated from each other by an interval. The electronic component and the passive component are disposed within the interval.

Abstract: A semiconductor package includes a first substrate, a second substrate, a conductive component, an electronic component and a passive component. The conductive component is disposed between the first substrate and the second substrate, wherein the first substrate and the second substrate are separated from each other by an interval. The electronic component and the passive component are disposed within the interval.

Abstract: A semiconductor package includes a first substrate, a second substrate, a conductive component, an electronic component and a passive component. The conductive component is disposed between the first substrate and the second substrate, wherein the first substrate and the second substrate are separated from each other by an interval. The electronic component and the passive component are disposed within the interval.

Abstract: A semiconductor package includes a first substrate, a second substrate, a conductive component, an electronic component and a passive component. The conductive component is disposed between the first substrate and the second substrate, wherein the first substrate and the second substrate are separated from each other by an interval. The electronic component and the passive component are disposed within the interval.

Abstract: A dual port static random access memory (DPSRAM) cell includes a first power line, a first bit line and a second bit line. The first power line is disposed between a first word line and a second word line. The first bit line is disposed between the first word line and the first power line. The second bit line is disposed between the second word line and the first power line.

Abstract: A dual port static random access memory (DPSRAM) cell includes a first power line, a first bit line and a second bit line. The first power line is disposed between a first word line and a second word line. The first bit line is disposed between the first word line and the first power line. The second bit line is disposed between the second word line and the first power line.

Abstract: A SRAM cell includes a first pass-gate device and a second-pass gate device comprising a first conductivity type, a first pull-down device and a second pull-down device comprising the first conductivity type, and a first pull-up device and a second pull-up device comprising a second conductivity type complementary to the first conductivity type. The first pass-gate device and the second pass-gate device respectively include first lightly-doped drains (hereinafter abbreviated as LDDs. The first pull-down device and the second pull-down device respectively include second LDDs. And a dosage of the first LDDs is different from a dosage of the second LDDs.

Abstract: The present invention provides a layout pattern of an 8-transistor static random access memory (8T-SRAM), at least including a first diffusion region, a second diffusion region and a third diffusion region disposed on a substrate, a critical dimension region being disposed between the first diffusion region and the third diffusion region. The critical dimension region directly contacts the first diffusion region and the third diffusion region, a first extra diffusion region, a second extra diffusion region and a third extra diffusion region disposed surrounding and directly contacting the first diffusion region, the second diffusion region and the third diffusion region respectively. The first, the second and the third extra diffusion region are not disposed within the critical dimension region.