Patents by Inventor Tienteh M. Chen

Tienteh M. Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Protecting layer for image recording materials
    Patent number: 6221546
    Abstract: The present invention is a coating composition comprising a water insoluble polymer having a Tg less than 25° C. and comprising 75 to 100 weight percent of the monomer having the following formula: wherein: X is selected from the group consisting of —Cl, —F, or —CN, and Y is each independently selected from the group consisting of H, Cl, F, CN, CF3, CH3, C2H5, n—C3H7, iso—C3H7, n—C4H9, n—CH11, n—C6H,13, OCH3, OC2H5, phenyl, C6F5, C6Cl5, CH2Cl, CH2F, Cl, F, CN, CF3, C2F5, n—C3F7, iso— C3F7, OCF3, OC2F5, OC3F7, C(CF3)3, CH2(CF3), CH(CF3)2, —COCF3, COC2F5, COCH3, COC2H5.
    Type: Grant
    Filed: July 15, 1999
    Date of Patent: April 24, 2001
    Assignee: Eastman Kodak Company
    Inventors: Hwei-Ling Yau, Kevin M. O'connor, Tienteh M. Chen, David E. Decker