Patents by Inventor Ties Wouter VAN DER WOORD
Ties Wouter VAN DER WOORD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11971654Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: June 9, 2023Date of Patent: April 30, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Publication number: 20240012332Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.Type: ApplicationFiled: November 12, 2021Publication date: January 11, 2024Applicant: ASML Netherlands B.V.Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Guilherme BRONDANI TORRI, Sebastianus Adrianus GOORDEN, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Edgar Alberto OSORIO OLIVEROS
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Publication number: 20240004184Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.Type: ApplicationFiled: November 8, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Sebastianus Adrianus GOORDEN, Alexis HUMBLET, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Guilherme BRONDANI TORRI, Edgar Alberto OSORIO OLIVEROS
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Publication number: 20230333462Abstract: A pellicle membrane for use in a lithographic apparatus, the pellicle membrane characterized by in plane variation in composition is described. A method of manufacturing a pellicle membrane, the method including: providing a first material layer on a sacrificial layer on a substrate; providing a photoresist layer on the first material layer; patterning the photoresist layer; etching the first material layer to form a patterned surface; and either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.Type: ApplicationFiled: August 5, 2021Publication date: October 19, 2023Applicant: ASML NETHERLANDS B. V.Inventors: Ties Wouter VAN DER WOORD, Alexander Ludwig KLEIN, Zomer Silvester HOUWELING, Inci DONMEZ NOYAN, Volker Dirk HILDENBRAND, Adrianus Johannes Maria HILDENBRAND, Johan Hendrik GIESBERS
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Publication number: 20230324786Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: June 9, 2023Publication date: October 12, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Evgenia KURGANOVA, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Leonid Aizikovitsj SJMAENOK, Ties Wouter VAN DER WOORD, David Ferdinand VLES
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Publication number: 20230311173Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.Type: ApplicationFiled: June 7, 2023Publication date: October 5, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Dmitry KURILOVICH, Fabio SBRIZZAI, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Willem Joan VAN DER ZANDE, Jeroen VAN DUIVENBODE, David Ferdinand VLES
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Patent number: 11686997Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: March 3, 2022Date of Patent: June 27, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Patent number: 11673169Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.Type: GrantFiled: November 22, 2019Date of Patent: June 13, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Andrey Nikipelov, Dmitry Kurilovich, Fabio Sbrizzai, Marcus Adrianus Van de Kerkhof, Ties Wouter Van der Woord, Willem Joan Van der Zande, Jeroen Van Duivenbode, David Ferdinand Vles
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Publication number: 20230050613Abstract: A pellicle membrane for a lithographic apparatus, the membrane including a matrix including a plurality of inclusions distributed therein. A method of manufacturing the pellicle membrane, a lithographic apparatus including the pellicle membrane, a pellicle assembly for use in a lithographic apparatus including the membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.Type: ApplicationFiled: December 15, 2020Publication date: February 16, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Ties Wouter VAN DER WOORD, Volker Dirk HILDENBRAND, Inci DONMEZ NOYAN, Adrianus Johannes Maria GIESBERS, Alexander Ludwig KLEIN
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Publication number: 20220276553Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.Type: ApplicationFiled: August 20, 2020Publication date: September 1, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Sander BALTUSSEN, Vadim Yevgenyevich BANINE, Alexandr DOLGOV, DONMEZ NOYAN, Zomer Silvester HOUWELING, Arnoud Willem NOTENBOOM, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Paul Alexander VERMEULEN, David Ferdinand VLES, Victoria VORONINA, Halil Gökay YEGEN
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Publication number: 20220269165Abstract: A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.Type: ApplicationFiled: July 24, 2020Publication date: August 25, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Paul JANSSEN, Maxime BIRON, Inci DONMEZ NOYAN, Lourdes FERRE LLIN, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Jan Hendrik Willem KUNTZEL, Arnoud Willem NOTENBOOM, Anne-Sophie ROLLIER, Ties Wouter VAN DER WOORD, Pieter-Jan VAN ZWOL
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Publication number: 20220187701Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: March 3, 2022Publication date: June 16, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Patent number: 11287737Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: GrantFiled: November 5, 2018Date of Patent: March 29, 2022Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
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Publication number: 20220035239Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.Type: ApplicationFiled: October 2, 2019Publication date: February 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Sander BALTUSSEN, Dennis DE GRAAF, Johannes Christiaan Leonardus FRANKEN, Adrianus Johannes Maria GIESBERS, Alexander Ludwig KLEIN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Alexey Sergeevich KUZNETSOV, Arnoud Willem NOTENBOOM, Mahdiar VALEFI, Marcus Adrianus VAN DE KERKHOF, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Ties Wouter VAN DER WOORD, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20220008963Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.Type: ApplicationFiled: November 22, 2019Publication date: January 13, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Dmitry KURILOVICH, Fabio SBRIZZAI, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Willem Joan VAN DER ZANDE, Jeroen VAN DUIVENBODE, David Ferdinand VLES
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Publication number: 20210181618Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.Type: ApplicationFiled: November 5, 2018Publication date: June 17, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Evgenia KURGANOVA, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Leonid Aizikovitsj SJMAENOK, Ties Wouter VAN DER WOORD, David Ferdinand VLES