Patents by Inventor Till Windischbauer

Till Windischbauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Maskless particle-beam system for exposing a pattern on a substrate
    Patent number: 6768125
    Abstract: A device (102) for defining a pattern, for use in a particle-beam exposure apparatus (100), said device adapted to be irradiated with a beam (lb,pb) of electrically charged particles and let pass the beam only through a plurality of apertures, comprises an aperture array means (203) and a blanking means (202). The aperture array means (203) has a plurality of apertures (21,230) of identical shape defining the shape of beamlets (bm). The blanking means (202) serves to switch off the passage of selected beamlets; it has a plurality of openings (220), each corresponding to a respective aperture (230) of the aperture array means (203) and being provided with a deflection means (221) controllable to deflect particles radiated through the opening off their path (p1) to an absorbing surface within said exposure apparatus (100). The apertures (21) are arranged on the blanking and aperture array means (202,203) within a pattern definition field (pf) being composed of a plurality of staggered lines (p1) of apertures.
    Type: Grant
    Filed: January 8, 2003
    Date of Patent: July 27, 2004
    Assignee: IMS Nanofabrication, GmbH
    Inventors: Elmar Platzgummer, Hans Loeschner, Gerhard Stengl, Herbert Vonach, Alfred Chalupka, Gertraud Lammer, Herbert Buschbeck, Robert Nowak, Till Windischbauer
  • Maskless particle-beam system for exposing a pattern on a substrate
    Publication number: 20030155534
    Abstract: A device (102) for defining a pattern, for use in a particle-beam exposure apparatus (100), said device adapted to be irradiated with a beam (lb,pb) of electrically charged particles and let pass the beam only through a plurality of apertures, comprises an aperture array means (203) and a blanking means (202). The aperture array means (203) has a plurality of apertures (21,230) of identical shape defining the shape of beamlets (bm). The blanking means (202) serves to switch off the passage of selected beamlets; it has a plurality of openings (220), each corresponding to a respective aperture (230) of the aperture array means (203) and being provided with a deflection means (221) controllable to deflect particles radiated through the opening off their path (p1) to an absorbing surface within said exposure apparatus (100). The apertures (21) are arranged on the blanking and aperture array means (202,203) within a pattern definition field (pf) being composed of a plurality of staggered lines (p1) of apertures.
    Type: Application
    Filed: January 8, 2003
    Publication date: August 21, 2003
    Inventors: Elmar Platzgummer, Hans Loeschner, Gerhard Stengl, Herbert Vonach, Alfred Chalupka, Gertraud Lammer, Herbert Buschbeck, Robert Nowak, Till Windischbauer