Patents by Inventor Tilo Sielaff

Tilo Sielaff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11886126
    Abstract: The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: January 30, 2024
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Klaus Edinger, Christian Felix Hermanns, Tilo Sielaff, Jens Oster, Christof Baur, Maksym Kompaniiets
  • Publication number: 20230152089
    Abstract: The present invention relates to a method for determining an alignment of a photomask on a sample stage which is displaceable along at least one axis that is parallel to a chuck surface of the sample stage, and is rotatable about at least one axis that is perpendicular to the chuck surface, which method comprises the following step: rotating the sample stage by a predefined angle and measuring a height change of the photomask during rotation at a predetermined, non-vanishing distance with respect to the rotation axis for the purpose of determining the alignment of the photomask on the sample stage.
    Type: Application
    Filed: January 18, 2023
    Publication date: May 18, 2023
    Inventors: Christof Baur, Tilo Sielaff, Arne Adams
  • Publication number: 20220011682
    Abstract: The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.
    Type: Application
    Filed: July 7, 2021
    Publication date: January 13, 2022
    Inventors: Klaus Edinger, Christian Felix Hermanns, Tilo Sielaff, Jens Oster, Christof Baur, Maksym Kompaniiets
  • Publication number: 20090032362
    Abstract: A wrap spring clutch according to some embodiments has a center shaft; a wrap spring wrapped around the center shaft in a direction of winding, and having two wrap spring ends and an abutting surface for co-operation with a friction surface; and a hollow shaft positioned around the wrap spring; and a cooling device positioned adjacent the friction surface.
    Type: Application
    Filed: July 30, 2008
    Publication date: February 5, 2009
    Inventors: Falk Nickel, Johann Oswald, Jurgen Ackermann, Tilo Sielaff