Abstract: In the case of a method for producing a fluid device with a fluid structure having an active height, a basic wafer is provided, which comprises a supporting substrate, an insulating layer on the supporting substrate and a patterned layer on the supporting substrate, the thickness of the patterned layer determining the active height of the fluid structure. Following this, the fluid structure is produced in the patterned layer of the basic wafer, said fluid structure extending through the semiconductor layer. A transparent wafer is then applied so that the fluid structure is covered. Subsequently, the supporting substrate and the insulating layer are removed from the back so that the fluid structure is exposed at a second surface of the patterned layer. Finally, a second transparent wafer is attached to the exposed second surface of the semiconductor layer so that the fluid structure is covered. The essential parameter of the fluid device, viz.

Abstract: A dosing device for demand-dosing a liquid includes a primary container, a point of release for releasing the liquid, a main liquid channel between the primary container and the point of release and a vented secondary container, wherein the secondary container is coupled to the main liquid channel at a branch point, wherein the secondary container and the main liquid channel are designed such that the main liquid channel preferably fills with the liquid before the secondary container. The dosing device further includes a liquid valve between the primary container and the branch point, a sensor for measuring the filling level in the secondary container and finally means for opening the valve responsive to a predetermined filling level in the secondary container.

Abstract: A dosing device for demand-dosing a liquid includes a primary container (10), a point of release (22) for releasing the liquid, a main liquid channel (16) between the primary container (10) and the point of release (22) and a vented secondary container (26), wherein the secondary container (26) is coupled to the main liquid channel 16 at a branch point (20), wherein the secondary container (26) and the main liquid channel (16) are designed such that the main liquid channel (16) preferably fills with the liquid before the secondary container (26). The dosing device further includes a liquid valve (18) between the primary container (10) and the branch point (20), a sensor (30) for measuring the filling level in the secondary container (26) and finally means (32) for opening the valve (18) responsive to a predetermined filling level in the secondary container (26).

Abstract: In the case of a method for producing a fluid device with a fluid structure having an active height, a basic wafer is provided, which comprises a supporting substrate, an insulating layer on the supporting substrate and a patterned layer on the supporting substrate, the thickness of the patterned layer determining the active height of the fluid structure. Following this, the fluid structure is produced in the patterned layer of the basic wafer, said fluid structure extending through the semiconductor layer. A transparent wafer is then applied so that the fluid structure is covered. Subsequently, the supporting substrate and the insulating layer are removed from the back so that the fluid structure is exposed at a second surface of the patterned layer. Finally, a second transparent wafer is attached to the exposed second surface of the semiconductor layer so that the fluid structure is covered. The essential parameter of the fluid device, viz.