Patents by Inventor Tim David Germann
Tim David Germann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9490608Abstract: The invention relates, inter alia, to a method for producing an electro-optical component (10, 200) suitable for emitting electromagnetic radiation (120), wherein in the method a first intermediate layer (60) is applied on a carrier, a second intermediate layer (70) is applied on the first intermediate layer, and after the second intermediate layer has been applied, the buried first intermediate layer is locally modified, wherein as a result of the local modification of the buried first intermediate layer in a lateral direction a refractive index jump is produced which brings about a lateral wave guiding of the electromagnetic radiation (120) in the unmodified region of the first intermediate layer.Type: GrantFiled: November 20, 2015Date of Patent: November 8, 2016Assignee: TECHNISCHE UNVERSITÄT BERLINInventors: André Strittmatter, Jan-Hindrik Schulze, Tim David Germann
-
Publication number: 20160079737Abstract: The invention relates, inter alia, to a method for producing an electro-optical component (10, 200) suitable for emitting electromagnetic radiation (120), wherein in the method a first intermediate layer (60) is applied on a carrier, a second intermediate layer (70) is applied on the first intermediate layer, and after the second intermediate layer has been applied, the buried first intermediate layer is locally modified, wherein as a result of the local modification of the buried first intermediate layer in a lateral direction a refractive index jump is produced which brings about a lateral wave guiding of the electromagnetic radiation (120) in the unmodified region of the first intermediate layer.Type: ApplicationFiled: November 20, 2015Publication date: March 17, 2016Applicant: TECHNISCHE UNVERSITÄT BERLINInventors: André STRITTMATTER, Jan-Hindrik SCHULZE, Tim David GERMANN
-
Patent number: 9225145Abstract: The invention relates, inter alia, to a method for producing an electro-optical component (10, 200) suitable for emitting electromagnetic radiation (120), wherein in the method a first intermediate layer (60) is applied on a carrier, a second intermediate layer (70) is applied on the first intermediate layer, and after the second intermediate layer has been applied, the buried first intermediate layer is locally modified, wherein as a result of the local modification of the buried first intermediate layer in a lateral direction a refractive index jump is produced which brings about a lateral wave guiding of the electromagnetic radiation (120) in the unmodified region of the first intermediate layer.Type: GrantFiled: June 21, 2012Date of Patent: December 29, 2015Assignee: Technische Universität BerlinInventors: André Strittmatter, Jan-Hindrik Schulze, Tim David Germann
-
Publication number: 20140126597Abstract: The invention relates, inter alia, to a method for producing an electro-optical component (10, 200) suitable for emitting electromagnetic radiation (120), wherein in the method a first intermediate layer (60) is applied on a carrier, a second intermediate layer (70) is applied on the first intermediate layer, and after the second intermediate layer has been applied, the buried first intermediate layer is locally modified, wherein as a result of the local modification of the buried first intermediate layer in a lateral direction a refractive index jump is produced which brings about a lateral wave guiding of the electromagnetic radiation (120) in the unmodified region of the first intermediate layer.Type: ApplicationFiled: June 21, 2012Publication date: May 8, 2014Inventors: André Strittmatter, Jan-Hindrik Schulze, Tim David Germann
-
Patent number: 8502197Abstract: A device including a locally modified buried first layer. A second layer is arranged on top of the first layer. The first layer includes at least one modified section and at least one unmodified section. The modified material of the locally modified buried first layer changes or induces mechanical strain in a portion of the second layer which is arranged above the at least one modified section. At least one nanostructure is placed on top of the second layer in an area, which is located above the at least one unmodified section of the first layer or adjacent thereto, said at least one nanostructure being formed by a strain-sensitive third material deposited on the locally strained second layer.Type: GrantFiled: December 11, 2012Date of Patent: August 6, 2013Assignee: Technische Universitat BerlinInventors: André Strittmatter, Andrei Schliwa, Tim David Germann, Udo W. Pohl, Vladimir Gaysler, Jan-Hindrik Schulze
-
Patent number: 8349712Abstract: The invention inter alia relates to a method of fabricating a layer assembly comprising the steps of: arranging a first layer on top of a carrier; arranging a second layer on top of the first layer; locally modifying the material of the buried first layer and providing at least one modified section in the first layer, wherein the modified material changes or induces mechanical strain in a portion of the second layer which is arranged above the at least one modified section; after locally modifying the material of the buried first layer, depositing a third material on top of the second layer, at least one characteristic of the third material being sensitive to the local mechanical strain in the second layer.Type: GrantFiled: March 30, 2011Date of Patent: January 8, 2013Assignee: Technische Universitat BerlinInventors: André Strittmatter, Andrei Schliwa, Tim David Germann, Udo W. Pohl, Vladimir Gaysler, Jan-Hindrik Schulze
-
Publication number: 20120248403Abstract: The invention inter alia relates to a method of fabricating a layer assembly comprising the steps of: arranging a first layer on top of a carrier; arranging a second layer on top of the first layer; locally modifying the material of the buried first layer and providing at least one modified section in the first layer, wherein the modified material changes or induces mechanical strain in a portion of the second layer which is arranged above the at least one modified section; after locally modifying the material of the buried first layer, depositing a third material on top of the second layer, at least one characteristic of the third material being sensitive to the local mechanical strain in the second layer.Type: ApplicationFiled: March 30, 2011Publication date: October 4, 2012Inventors: André STRITTMATTER, Andrei Schliwa, Tim David Germann, Udo W. Pohl, Vladimir Gaysler, Jan-Hindrik Schulze