Patents by Inventor Tim Egge

Tim Egge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11718905
    Abstract: Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted deposition system, disposing the substrate in a first zone including a first evaporator species and a first ion beam, wherein the first evaporator species is Aluminum Oxide (Al2O3), disposing the substrate in a second zone including a second evaporator species and a second ion beam, wherein the second evaporator species is Yttrium Oxide (Y2O3), and disposing the substrate in a third zone including a third evaporator species and a third ion beam, wherein the third evaporator species is Yttrium Fluoride (YF3).
    Type: Grant
    Filed: May 30, 2018
    Date of Patent: August 8, 2023
    Assignee: Technetics Group LLC
    Inventors: Nader Kalkhoran, Eric Tobin, Tim Egge, Jason Burns, Rick Oliver, Angus McFadden, Jason Wright
  • Publication number: 20200232087
    Abstract: Techniques for generating a multi-layered thin film coating for dental applications are disclosed. An example of a dental substrate with an aesthetic coating includes a barrier layer deposited on the dental substrate, a textured layer deposited over the barrier layer, the textured layer comprising a first material with features of a size sufficient to scatter light, and at least one protective layer deposited over the textured layer.
    Type: Application
    Filed: January 22, 2020
    Publication date: July 23, 2020
    Inventors: Jason E. BURNS, Tim EGGE
  • Publication number: 20200131619
    Abstract: Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted deposition system, disposing the substrate in a first zone including a first evaporator species and a first ion beam, wherein the first evaporator species is Aluminum Oxide (Al2O3), disposing the substrate in a second zone including a second evaporator species and a second ion beam, wherein the second evaporator species is Yttrium Oxide (Y2O3), and disposing the substrate in a third zone including a third evaporator species and a third ion beam, wherein the third evaporator species is Yttrium Fluoride (YF3).
    Type: Application
    Filed: May 30, 2018
    Publication date: April 30, 2020
    Inventors: Nader Kalkhoran, Eric Tobin, Tim Egge, Jason Burns, Rick Oliver, Angus McFadden, Jason Wright