Abstract: A method of manufacturing a cadmium (Cd) alloy transmissive solar cell is provided. The method includes pumping a vacuum chamber to a base pressure and pumping the vacuum chamber to a sputtering pressure. The method includes providing into the vacuum chamber a first gas at a rate that balances a flow of the first gas in and out of the vacuum chamber with respect to the sputtering pressure and heating a surface of a partially manufactured cadmium (Cd) alloy transmissive solar cell within the vacuum chamber to a calibrated deposition temperature. The method includes providing into the vacuum chamber a second gas including at least a hydrogen gas (H2) at a proportional rate to achieve a target gas mix while maintaining the sputtering pressure and depositing a target material onto the surface to form a back contact section of the cadmium (Cd) alloy transmissive solar cell.

Abstract: A method of manufacturing a cadmium (Cd) alloy transmissive solar cell is provided. The method includes pumping a vacuum chamber to a base pressure and pumping the vacuum chamber to a sputtering pressure. The method includes providing into the vacuum chamber a first gas at a rate that balances a flow of the first gas in and out of the vacuum chamber with respect to the sputtering pressure and heating a surface of a partially manufactured cadmium (Cd) alloy transmissive solar cell within the vacuum chamber to a calibrated deposition temperature. The method includes providing into the vacuum chamber a second gas including at least a hydrogen gas (H2) at a proportional rate to achieve a target gas mix while maintaining the sputtering pressure and depositing a target material onto the surface to form a back contact section of the cadmium (Cd) alloy transmissive solar cell.

Abstract: An ultra-thin transmissive cadmium (Cd) alloy solar cell is provided. The ultra-thin transmissive cadmium (Cd) alloy solar cell includes a substrate section, a conductive section, a window section, and an absorber section. The absorber section includes a transmissive cadmium (Cd) alloy and a seven hundred (700) or less nanometer (nm) section thickness. The ultra-thin transmissive cadmium (Cd) alloy solar cell includes a percent (10%) transmissivity for portions of a first irradiance wavelength range between three hundred fifty (350) nanometers (nm) to approximately eight hundred twenty-five (825) nanometers (nm). The ultra-thin transmissive cadmium (Cd) alloy solar cell includes a sixty-five percent (65%) transmissivity for portions of a second irradiance wavelength range between to approximately eight hundred twenty-five (825) nanometers (nm) to one thousand two hundred (1200) nanometers (nm).

Abstract: Methods of forming a conductive fluorine-doped metal oxide layer on a substrate by chemical vapor deposition are described. The methods may include heating the substrate in a processing chamber, and introducing a metal-containing precursor and a fluorine-containing precursor to the processing chamber. The methods may also include adding an oxygen-containing precursor to the processing chamber. The precursors are reacted to deposit the fluorine-doped metal oxide layer on the substrate. Methods may also include forming the conductive fluorine-doped metal oxide layer by plasma-assisted chemical vapor deposition. These methods may include providing the substrate in a processing chamber, and introducing a metal-containing precursor, and a fluorine-containing precursor to the processing chamber. A plasma may be formed that includes species from the metal-containing precursor and the fluorine-containing precursor. The species may react to deposit the fluorine-doped metal oxide layer on the substrate.

Abstract: Methods of forming a conductive fluorine-doped metal oxide layer on a substrate by chemical vapor deposition are described. The methods may include heating the substrate in a processing chamber, and introducing a metal-containing precursor and a fluorine-containing precursor to the processing chamber. The methods may also include adding an oxygen-containing precursor to the processing chamber. The precursors are reacted to deposit the fluorine-doped metal oxide layer on the substrate. Methods may also include forming the conductive fluorine-doped metal oxide layer by plasma-assisted chemical vapor deposition. These methods may include providing the substrate in a processing chamber, and introducing a metal-containing precursor, and a fluorine-containing precursor to the processing chamber. A plasma may be formed that includes species from the metal-containing precursor and the fluorine-containing precursor. The species may react to deposit the fluorine-doped metal oxide layer on the substrate.