Patents by Inventor Tim HOUBEN

Tim HOUBEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250003899
    Abstract: Systems and methods for image analysis include obtaining a plurality of simulation images and a plurality of non-simulation images both associated with a sample under inspection, at least one of the plurality of simulation images being a simulation image of a location on the sample not imaged by any of the plurality of non-simulation images; and training an unsupervised domain adaptation technique using the plurality of simulation images and the plurality of non-simulation images as inputs to reduce a difference between first intensity gradients of the plurality of simulation images and second intensity gradients of the plurality of non-simulation images.
    Type: Application
    Filed: October 14, 2022
    Publication date: January 2, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Tim HOUBEN, Maxim PISARENCO, Thomas Jarik HUISMAN, Lingling PU, Jian ZHOU, Liangjiang YU, Yi-Hsin CHANG, Yun-Ling YEH
  • Publication number: 20240054669
    Abstract: A system, method, and apparatus for determining three-dimensional (3D) information of a structure of a patterned substrate. The 3D information can be determined using one or more models configured to generate 3D information (e.g., depth information) using only a single image of a patterned substrate. In a method, the model is trained by obtaining a pair of stereo images of a structure of a patterned substrate. The model generates, using a first image of the pair of stereo images as input, disparity data between the first image and a second image, the disparity data being indicative of depth information associated with the first image. The disparity data is combined with the second image to generate a reconstructed image corresponding to the first image. Further, one or more model parameters are adjusted based on the disparity data, the reconstructed image, and the first image.
    Type: Application
    Filed: November 24, 2021
    Publication date: February 15, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Tim HOUBEN, Thomas Jarik HUISMAN, Maxim PISARENCO, Scott Anderson MIDDLEBROOKS, Chrysostomos BATISTAKIS, Yu CAO