Patents by Inventor Tim Rathje

Tim Rathje has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Image sensor for immersion lithography
    Patent number: 11774868
    Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.
    Type: Grant
    Filed: April 7, 2020
    Date of Patent: October 3, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nirupam Banerjee, Johan Franciscus Maria Beckers, Peter Brakhage, Arend Johannes Donkerbroek, Daniel Grimm, Tim Rathje, Martin Tilke, Sandro Wricke
  • IMAGE SENSOR FOR IMMERSION LITHOGRAPHY
    Publication number: 20220163896
    Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.
    Type: Application
    Filed: April 7, 2020
    Publication date: May 26, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nirupam BANERJEE, Johan Franciscus Maria BECKERS, Peter BRAKHAGE, Arend Johannes DONKERBROEK, Daniel GRIMM, Tim RATHJE, Martin TILKE, Sandro WRICKE
  • Method and device for the fast phase evaluation, in particular of multi-cycle pulses of laser radiation
    Patent number: 9194753
    Abstract: The aim of the present disclosure is to enable a fast CE phase evaluation of the laser pulses, in particular in real time, including for multi-cycle pulses. Said aim is achieved by providing a polarization gating stage (8) for changing the laser pulses (7) to be evaluated in the phase and subsequent phase evaluation stage (15) for measuring the phase position of the changed laser pulses. The descriptions in the present disclosure can be used for example in laser technology for producing and monitoring single-cycle pulses.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: November 24, 2015
    Assignee: FEMTOLASERS PRODUKTIONS GMBH
    Inventors: Gerhard Georg Paulus, Arthur Maxwell Sayler, Tim Rathje, Max Möller, Dominik Hoff
  • METHOD AND DEVICE FOR THE FAST PHASE EVALUATION, IN PARTICULAR OF MULTI-CYCLE PULSES OF LASER RADIATION
    Publication number: 20140023099
    Abstract: The aim of the present disclosure is to enable a fast CE phase evaluation of the laser pulses, in particular in real time, including for multi-cycle pulses. Said aim is achieved by providing a polarization gating stage (8) for changing the laser pulses (7) to be evaluated in the phase and subsequent phase evaluation stage (15) for measuring the phase position of the changed laser pulses. The descriptions in the present disclosure can be used for example in laser technology for producing and monitoring single-cycle pulses.
    Type: Application
    Filed: March 30, 2012
    Publication date: January 23, 2014
    Inventors: Gerhard Georg Paulus, Arthur Maxwell Sayler, Tim Rathje, Max Möller, Dominik Hoff