Abstract: A method to produce a hard coating onto a substrate, wherein the hard coating comprises a hydrogen-free amorphous carbon coating, wherein the amorphous carbon coating is deposited onto the substrate using a cathodic arc discharge deposition technique, wherein a bias voltage is applied to the substrate with an absolute value that is greater than 0 V, preferably greater than 10 V and less than 1000 V, and wherein the absolute value of the bias voltage is increased during the coating process to obtain a first structure and a second structure and a gradient between the first and the second structure along the coating thickness, wherein the first and the second structure comprise sp2 and sp3 carbon bonds but differ in their relative concentration, wherein at least one coating pause is applied during the coating process in order to reduce the substrate temperature during the coating pause.

Abstract: Method for the production of a Mo—N-based coating structure, including: providing a substrate to be coated and applying a hard material layer on the substrate, wherein the hard material layer includes at least one layer of Mo—N having a hexagonal crystal structure and at least one layer of Mo—N having a cubic crystal structure or a mixed hexagonal/cubic crystal structure, wherein the hard material layer is applied by a low temperature closed field unbalanced reactive magnetron sputtering coating process.

Abstract: A method to produce a hard coating onto a substrate, wherein the hard coating comprises a hydrogen-free amorphous carbon coating, wherein the amorphous carbon coating is deposited onto the substrate using a cathodic arc discharge deposition technique, wherein a bias voltage is applied to the substrate with an absolute value that is greater than 0 V, preferably greater than 10 V and less than 1000 V, and wherein the absolute value of the bias voltage is increased during the coating process to obtain a first structure and a second structure and a gradient between the first and the second structure along the coating thickness, wherein the first and the second structure comprise sp2 and sp3 carbon bonds but differ in their relative concentration, wherein at least one coating pause is applied during the coating process in order to reduce the substrate temperature during the coating pause.

Abstract: The invention relates to novel and improved halogen-free flame retardant compounds having the structure of Formula (I): wherein: R1 and R2 are independently hydrogen, C1-C6 alkyl, —P(O)(OR3)2, —P(O)OR3R4, or —P(O)R32, wherein R3 and R4 are independently C1-C4 alkyl, C6-C12 aryl, C7-C15 aralkyl or C7-C15 alkaryl; or R1 and R2 taken together form an unsaturated cyclic ring, which is optionally substituted by an alkyl group; each k is independently an integer from 1 to 2; each X is independently oxygen (O) or sulphur (S); v is 0 or 1; each Y is independently C1-C4 alkylene, C6 arylene, C7-C15 aralkylene, C7-C15 alkarylene, oxygen (O), nitrogen (NR), wherein R is H or C1-C4 alkyl; n is 0, 1 or 2 with the proviso that n is 1 when Y is oxygen (O) or nitrogen (NR); each Z is independently C1-C4 alkylene, C6 arylene, C7-C15 aralkylene or C7-C15 is alkarylene; m is independently 0, 1 or 2; with the proviso that when Y is oxygen (O) or nitrogen (N), m cannot be 0; each Q is independently C1-C4 alkylene; t is an integer

Abstract: The invention relates to novel and improved halogen-free flame retardant compounds having the structure of Formula (I): wherein: R1 and R2 are independently hydrogen, C1-C6 alkyl, —P(O)(OR3)2, —P(O)OR3R4, or —P(O)R32, wherein R3 and R4 are independently C1-C4 alkyl, C6-C12 aryl, C7-C15 aralkyl or C7-C15 alkaryl; or R1 and R2 taken together form an unsaturated cyclic ring, which is optionally substituted by an alkyl group; each k is independently an integer from 1 to 2; each X is independently oxygen (O) or sulphur (S); v is 0 or 1; each Y is independently C1-C4 alkylene, C6 arylene, C7-C15 aralkylene, C7-C15 alkarylene, oxygen (O), nitrogen (NR), wherein R is H or C1-C4 alkyl; n is 0, 1 or 2 with the proviso that n is 1 when Y is oxygen (O) or nitrogen (NR); each Z is independently C1-C4 alkylene, C6 arylene, C7-C15 aralkylene or C7-C15 is alkarylene; m is independently 0, 1 or 2; with the proviso that when Y is oxygen (O) or nitrogen (N), m cannot be 0; each Q is independently C1-C4 alkylene; t is an integer