Patents by Inventor Timo Stuffler

Timo Stuffler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for the operation of a plasma device
    Patent number: 7869556
    Abstract: A method for the operation of a plasma device (100) is described in which particles (2) are arranged in a plasma, wherein a generation of electric travelling waves (1) is provided, under whose effective action the particles (2) in the plasma device (100) perform a directed movement to at least one pre-determined collection area (20, 20A). A plasma device for carrying out the method is also described.
    Type: Grant
    Filed: December 9, 2005
    Date of Patent: January 11, 2011
    Assignee: Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
    Inventors: Gregor Morfill, Uwe Konopka, Hubertus M. Thomas, Wolfgang Jacob, Beatrice Annaratone, Martin Fink, Noriyoshi Sato, Tetsuji Shimizu, Timo Stuffler
  • Method and Device For the Operation of a Plasma Device
    Publication number: 20080136332
    Abstract: A method for the operation of a plasma device (100) is described in which particles (2) are arranged in a plasma, wherein a generation of electric travelling waves (1) is provided, under whose effective action the particles (2) in the plasma device (100) perform a directed movement to at least one pre-determined collection area (20, 20A). A plasma device for carrying out the method is also described.
    Type: Application
    Filed: December 9, 2005
    Publication date: June 12, 2008
    Inventors: Gregor Morfill, Uwe Konopka, Hubertus M. Thomas, Wolfgang Jacob, Beatrice Annaratone, Martin Fink, Noriyoshi Sato, Tetsuji Shimizu, Timo Stuffler
  • Device for specific particle manipulation and deposition
    Patent number: 6777880
    Abstract: A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasmacrystalline state, and the particles are exposed in a location-selective manner to external adjustment forces and/or the plasma conditions are subjected to a location-selective change to apply at least a portion of the particles onto a substrate surface mask-free and/or subject it to a location-selective plasma treatment in the carrier or reaction gas.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: August 17, 2004
    Assignees: Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V., Kayser-Threde GmbH
    Inventors: Gregor Morfill, Hubertus Thomas, Timo Stuffler, Uwe Konopka
  • Device for specific particle manipulation and deposition
    Publication number: 20030185983
    Abstract: A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasmacrystalline state, and the particles are exposed in a location-selective manner to external adjustment forces and/or the plasma conditions are subjected to a location-selective change to apply at least a portion of the particles onto a substrate surface mask-free and/or subject it to a location-selective plasma treatment in the carrier or reaction gas.
    Type: Application
    Filed: March 31, 2003
    Publication date: October 2, 2003
    Applicants: Max-Planck-Gesellschaft zur Forderung der Wissenschaften e. V., Kayser-Threde GmbH
    Inventors: Gregor Morfill, Thomas Hubertus, Timo Stuffler, Uwe Konopka
  • Procedure and device for specific particle manipulation and deposition
    Patent number: 6616987
    Abstract: A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasmacrystalline state, and the particles are exposed in a location-selective manner to external adjustment forces and/or the plasma conditions are subjected to a location-selective change to apply at least a portion of the particles onto a substrate surface mask-free and/or subject it to a location-selective plasma treatment in the carrier or reaction gas.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: September 9, 2003
    Assignee: Max-Planck-Gesellschaft zur Forderung der Wissenschaften E.V.
    Inventors: Gregor Morfill, Hubertus Thomas, Timo Stuffler, Uwe Konopka
  • Particle manipulation
    Patent number: 6517912
    Abstract: In a method for manipulating particles arranged in a plasma-cristalline state in a plasma of a carrier gas, the particles are at least partially subject to plasma treatment and/or applied to a substrate surface. A device for manipulating of particles in plasma-cristalline state includes a reaction vessel, in which plasma electrodes and at least one substrate are situated. An adaptive electrode for formation of a location selective low frequency or static electrical field in the reaction vessel is described.
    Type: Grant
    Filed: November 29, 1999
    Date of Patent: February 11, 2003
    Assignees: Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V., Kayser-Threde GmbH
    Inventors: Gregor Morfill, Hubertus Thomas, Timo Stuffler, Uwe Konopka