Abstract: A micro-fabricated structure and method of forming a micro-fabricated structure are disclosed. The method includes the steps of forming a first pattern in a first photo-resist, transferring the first pattern in the first photo-resist to a mask layer, forming a second pattern in a second photo-resist, and transferring the second pattern in the second photo-resist to the mask layer. In various embodiments, the method may further include the steps of forming a first pattern in a first photo-resist, forming a second pattern in a second photo-resist, and transferring the first and second patterns to a target layer.

Abstract: A beam, from a short-coherence-length source, is split and recombined by diffraction gratings not necessarily equal in spatial period. The recombining beams overlap and expose a common area on a substrate. The exposed area on the substrate is defined or shaped by at least one aperture in the beam paths. After exposure of one shaped area, relative translation between components permits exposure of another shaped area on the substrate. Additionally or alternatively, by introducing either rotation or translation between components during each exposure, the exposed area is made larger than the original shaped area.