Abstract: A hydrogen system for generating power may include a fuel cell stack selectively coupled to a hydrogen fuel source. A control may be configured to cause the fuel cell stack to operate in a first mode in response to a first predetermined temperature threshold being met such that the fuel cell stack may generate electricity when below a target operating temperature. The control may be configured to cause the fuel cell stack to operate in a second mode in response to a second predetermined temperature threshold being met subsequent to the first predetermined temperature threshold being met. A method of operating a fuel cell stack is also disclosed.

Abstract: A building-construction panel includes a tongue on one edge and a groove on an opposite edge that receives the tongue of an adjacent panel. A shoulder on the tongue-side edge defines an abutted surface that is contacted by an abutting surface on the groove-side edge to limit panel travel during installation and maintain a gap between upper edge portions of the adjacent panels. A bottom transition is formed on the groove-side edge so that the groove-side abutting surface is smaller than the tongue-side shoulder abutted surface. In this way, the relatively smaller groove-side abutting surface structurally maintains the gap but also minimizes frictional interpanel contact area to minimize squeaking. And the relatively larger tongue-side shoulder abutted surface helps keep the shoulder from being collapsed into the groove from overdriving the panels together during installation. In typical embodiments, the panel is a high-performance structural wood subflooring panel.

Abstract: Methods for making thin-films on semiconductor substrates, which may be patterned using EUV, include: depositing the organometallic polymer-like material onto the surface of the semiconductor substrate, exposing the surface to EUV to form a pattern, and developing the pattern for later transfer to underlying layers. The depositing operations may be performed by chemical vapor deposition (CVD), atomic layer deposition (ALD), and ALD with a CVD component, such as a discontinuous, ALD-like process in which metal precursors and counter-reactants are separated in either time or space.

Abstract: Systems and methods for creating fingerprints for devices are described herein. In various embodiments, the system includes a device management system operatively coupled to a merchant system. According to particular embodiments, the device management system: 1) receives a first payload correspond to a device from the merchant system, the first payload including data in a particular format; 2) creates a fingerprint for the device by parsing the first payload and creating a record of a section format for each of one or more distinct sections of the particular format; and 3) comparing a format of each subsequent payload that corresponds to the device to the fingerprint for the device to determine whether the device has been compromised.

Abstract: The exemplified intrinsic phase space tomography methods and systems facilitate the analysis and evaluation of complex, quasi-periodic system by generating computed phase-space tomographic images as a representation of the dynamics of the quasi-periodic cardiac systems. The computed phase-space tomographic images can be presented to a physician to assist in the assessment of presence or non-presence of disease.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: The exemplified methods and systems facilitate the configuration and training of a neural network (e.g., a deep neural network, a convolutional neural network (CNN), etc.), or ensemble(s) thereof, with a biophysical signal data set to ascertain estimate for the presence or non-presence of disease or pathology in a subject as well as to assess and/or classify disease or pathology, including for example in some cases the severity of such disease or pathology, in a subject. In the context of the heart, the methods and systems described herein facilitate the configuration and training of a neural network, or ensemble(s) thereof, with a cardiac signal data set to ascertain estimate for the presence or non-presence of coronary artery disease or coronary pathology.

Abstract: A microphone having a multi-channel mixer and one or more connectors usable to receive and/or output audio. Any of the connectors may be used as an input connector, as an output connector, or configured to be switchable between being an input and an output connector. The user of the microphone may be able to conveniently use one or more of the connectors to expand the microphone to become part of a larger setup that uses multiple microphones. For example, an XLR connector of the microphone may be passive, and may be configured such that a user can daisy chain the output from an XLR connector of another microphone into an XLR connector of the microphone. In such an arrangement, an output based on one or both of the microphones may be output through another connector of the microphone, such as a USB connector.

Abstract: A cyber security system mainly designed to prevent insider attacks. A security importance number is probabilistically assigned to each relevant object that the user wishes to protect. Then whenever a change is requested of a particular protected object, a security importance number threshold check is probabilistically made based on N+1 generated administrative profiles which then have a time limit to manually interfere with the predicted outcome before a change is implemented.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: A fixture assembly for supporting workpieces in a coating process includes a shaft; and a plurality of fixtures each having a workpiece support surface and a shaft mount defining a shaft mounting structure, wherein the shaft mounting structure extends from the workpiece support surface such that, when the shaft mounting structure is engaged with the shaft, workpiece support surfaces of the fixtures are positioned facing radially outwardly away from the shaft.

Abstract: The exemplified methods and systems provide a phase space volumetric object in which the dynamics of a complex, quasi-periodic system, such as the electrical conduction patterns of the heart, or other biophysical-acquired signals of other organs, are represented as an image of a three dimensional volume having both a volumetric structure (e.g., a three dimensional structure) and a color map to which features can be extracted that are indicative the presence and/or absence of pathologies, e.g., ischemia relating to significant coronary arterial disease (CAD). In some embodiments, the phase space volumetric object can be assessed to extract topographic and geometric parameters that are used in models that determine indications of presence or non-presence of significant coronary artery disease.

Abstract: An illustrative example hydrogen concentration sensor includes a hydrogen chamber configured to isolate hydrogen within the hydrogen chamber from gas outside the hydrogen chamber. A hydrogen evolving electrode is configured to generate pure hydrogen within the hydrogen chamber. A reference electrode is situated to be exposed to pure hydrogen within the hydrogen chamber. A detection electrode associated with the reference electrode is situated to be exposed to gas outside the hydrogen chamber. The detection electrode is configured to provide an indication of a concentration of hydrogen in the gas outside the hydrogen chamber.

Abstract: Provided are processes for development of photopatterned metal or metal oxide-based thin film photoresists post-EUV exposure for removal of non-volatile species and deterring etch stop. Repeated cycles of alternating treatment with an etchant and an oxidizing agent; or treatment with an etchant followed by treatment with a wash agent are effective techniques for removal of the undesired unexposed portion of a photoresist.

Abstract: In some implementations, a computing device may include receiving one or more measurements of drilling parameters. In addition, the computing device may include accessing historical drilling logs for one or more wells in a geographic region. Also, the computing device may include training, using one or more processors, a machine learning model to determine predicted values for a triple combo log for a new well in the geographic region. Further, the computing device may include determining, using the one or more processors, one or more formation properties from the triple combo log. In addition, the computing device may include determining, using the one or more processors, an adjustment to one or more drilling parameters based at least on the one or more formation properties. The adjustment can be applied to a drilling process on a drilling rig.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: A cyber security system mainly designed to prevent insider attacks. A security importance number is assigned to each relevant object that the user wishes to protect. Then whenever a change is requested of a particular protected object, a security importance number threshold check is made and N+1 many administrators must approve of the change before the change is implemented.

Abstract: The present disclosure relates generally to communication with payment terminals via TCP/IP protocol. Using network technology and novel processes, in particular embodiments, the present systems and methods facilitate local network discovery and communication between a payment terminal and an electronic cash register (“ECR”) via a browser. For example, in certain embodiments, the present systems and methods leverage TCP/IP network technology to securely facilitate communications between SaaS ECR software running in a browser environment and one or more payment terminals.

Abstract: The present disclosure relates to a composition formed with an organometallic precursor and a dopant precursor, as well as methods for forming and employing such compositions. In particular embodiments, the dopant precursor provides an element into the composition to increase quantum efficiency, such as by increasing radiation absorption and/or by increasing secondary electron emission or secondary electron yield (SEY) within the composition. In non-limiting embodiments, the radiation can include extreme ultraviolet (EUV) or deep ultraviolet (DUV) radiation.