Patents by Inventor Timothy A. Wooldridge

Timothy A. Wooldridge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer processing apparatus
    Patent number: 4875989
    Abstract: A processing apparatus and method for edge-preferential processing of partially fabricated integrated circuit wafers or of other substantially flat and thin workpieces. A plasma remote from the workpiece is used to generate activated species, and a baffle which is in proximity to the wafer face but not in contact with it is used to direct the stream of activated species. This module can be set up to perform both edge bead removal and bake of spun-on photoresist.
    Type: Grant
    Filed: December 5, 1988
    Date of Patent: October 24, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: Cecil J. Davis, Robert T. Matthews, Lee M. Loewenstein, Joe V. Abernathy, Timothy A. Wooldridge
  • Plasma etching using improved electrode
    Patent number: 4297162
    Abstract: Radio frequency plasma etching of conductive coatings on semiconductor slices is improved by the use of a curved electrode which is closer to the slice at the center than at the periphery. Preferably, the electrode is in a symmetrical chamber which contains only one slice, and reactant gases are admitted through apertures in the electrode. An r.f. power source is connected between the electrode and a holder for the slice.
    Type: Grant
    Filed: October 17, 1979
    Date of Patent: October 27, 1981
    Assignee: Texas Instruments Incorporated
    Inventors: Randall S. Mundt, Timothy A. Wooldridge, Thomas O. Blasingame