Patents by Inventor Timothy Brian Stachowiak

Timothy Brian Stachowiak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170285479
    Abstract: A nanoimprint lithography method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating, and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. The imprint resist is a polymerizable composition and includes a polymerization initiator. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating is contacted with a nanoimprint lithography template. The polymerization initiator is activated, and the composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate.
    Type: Application
    Filed: March 24, 2017
    Publication date: October 5, 2017
    Inventors: Timothy Brian Stachowiak, Weijun Liu
  • Publication number: 20170068159
    Abstract: A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.
    Type: Application
    Filed: January 22, 2016
    Publication date: March 9, 2017
    Inventors: Niyaz Khusnatdinov, Timothy Brian Stachowiak, Weijun Liu
  • Publication number: 20170066208
    Abstract: A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition-and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.
    Type: Application
    Filed: June 28, 2016
    Publication date: March 9, 2017
    Inventors: Niyaz Khusnatdinov, Timothy Brian Stachowiak, Weijun Liu