Abstract: A one-piece molded polymeric sight gauge shield with internal cylindrical bore and method for making same are disclosed, along with a liquid-containing urn including same. The shield is molded by mating first and second mold portions about first and second spaced-apart cores to define: (i) a first annular void about the first core; and, (ii) a second annular void about the second core. The first and second mold portions respectively comprise first and second stand-up portions that first and second sidewall voids between themselves and the mating mold portion. First and second end portions of a gauge shield member are molded by filling the first and second voids, while the first and second sidewalls of the gauge shield member are molded by filling the first and second sidewall voids. The molding operation is a single-axis straight-pull molding method.

Abstract: A one-piece molded polymeric sight gauge shield with internal cylindrical bore and method for making same are disclosed, along with a liquid-containing urn including same. The shield is molded by mating first and second mold portions about first and second spaced-apart cores to define: (i) a first annular void about the first core; and, (ii) a second annular void about the second core. The first and second mold portions respectively comprise first and second stand-up portions that first and second sidewall voids between themselves and the mating mold portion. First and second end portions of a gauge shield member are molded by filling the first and second voids, while the first and second sidewalls of the gauge shield member are molded by filling the first and second sidewall voids. The molding operation is a single-axis straight-pull molding method.

Abstract: A method of fabricating an attenuating phase shift photolithographic mask which will reduce the formation of side-lobes adjacent to large structures in the kerf regions on the patterned wafer. These structures are typically much larger in size than device nominal, and this method may be applied to either one axis or both axes of the kerf structure depending on it's susceptibility to form side-lobes. A substantially defect free optical lithography mask having partially transmissive attenuating phase-shift regions, transmissive clear regions, and more opaque than partially transmissive regions is fabricated by first depositing an attenuating phase-shifting layer on the top surface of a transmissive substrate followed by deposition of a more opaque than partially transmissive layer on top of the partially transmissive attenuating phase-shifting layer. Next an image transfer layer is deposited on top of the more opaque than partially transmissive layer.