Abstract: Organopolysiloxanes bearing regularly spaced pendent carboxylic acid groups or salts thereof have a block polymer structure and are derived by the double half-esterification of a dianhydride and a silanol- or carbinol-functional organopolysiloxane or sulfur analog thereof. The products can form stable aqueous dispersions without the need for a surfactant.

Abstract: Organopolysiloxanes bearing regularly spaced pendent carboxylic acid groups or salts thereof have a block polymer structure and are derived by the double half-esterification of a dianhydride and a silanol- or carbinol-functional organopolysiloxane or sulfur analog thereof. The products can form stable aqueous dispersions without the need for a surfactant.

Abstract: Organopolysiloxanes having a greater degree of defined reactivity through epoxy, isocyanate, anhydride, amino, carboxy, and (meth)acrylate groups are prepared by cohydrolytic condensation of reactive group-containing precursors and other condensable precursors in amounts such that the reactive organopolysiloxanes product contains on average more than two reactive groups, less than 20% by weight of alkoxy groups, and a proportion of non-reactive optionally substituted hydrocarbon groups such that the ratio of non-reactive hydrocarbon groups to Si atoms is greater than 1.

Abstract: Organopolysiloxanes having a greater degree of defined reactivity through epoxy, isocyanate, anhydride, amino, carboxy, and (meth)acrylate groups are prepared by cohydrolytic condensation of reactive group-containing precursors and other condensable precursors in amounts such that the reactive organopolysiloxanes product contains on average more than two reactive groups, less than 20% by weight of alkoxy groups, and a proportion of non-reactive optionally substituted hydrocarbon groups such that the ratio of non-reactive hydrocarbon groups to Si atoms is greater than 1.

Abstract: Aqueous emulsions of epoxy- and organo-substituted, branched organopolysiloxanes are prepared by emulsifying the latter in water with the aid of a dispersing agent. The emulsions are storage stable and are useful in multi-component coating, adhesive, and binder systems.

Abstract: Aqueous emulsions of epoxy- and organo-substituted, branched organopolysiloxanes are prepared by emulsifying the latter in water with the aid of a dispersing agent. The emulsions are storage stable and are useful in multi-component coating, adhesive, and binder systems.

Abstract: A retaining ring structure for a chemical mechanical polishing (CMP) apparatus includes a plurality of protrusions formed on a bottom surface of a retaining ring configured for retaining a workpiece to be polished, the protrusions disposed so as to be in contact with a polishing pad during a polishing operation on the workpiece.

Abstract: By adding silica to ceria-based CMP slurries the polish process starts much faster than without silica thereby eliminating dead time in the polish process and eliminating process instability caused by changes in the dead time with operating conditions. A slurry for performing chemical mechanical polishing (CMP) of patterned oxides (e.g., STI, PMD, ILD) on a substrate, comprises: ceria particles having a concentration of 1.0-5.0 wt % and silica particles having a concentration of 0.1-5.0 wt %. A ratio of ceria concentration to silica concentration (ceria:silica) is from approximately 10:1 to nearly 1:1 by weight. The ceria particles have a particle size of 150-250 nm, and the silica particles have a particle size of greater than 100 nm. The silica may be fumed or colloidal. The slurry has a pH of approximately 9.0.