Patents by Inventor Timothy Michael Holt

Timothy Michael Holt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11313802
    Abstract: Disclosed is a system for detecting contaminants in a sample fluid. The system has a colloidal dispersion circuit with a reservoir containing a colloidal dispersion with colloidal particles capable of exhibiting localized surface plasmon resonance (“LSPR particles”), a Raman spectrometer/flow cell and a pump for circulating the colloidal dispersion through the colloidal dispersion circuit. A colloidal dispersion level sensor measures the extent of colloidal dispersion in the colloidal dispersion circuit. A permeation valve diverts the colloidal dispersion in the colloidal dispersion circuit through an ultra-filtration membrane with a pore size smaller than the LSPR particles, thus preventing the LSPR particles from passing through. The sample may be introduced into the colloidal dispersion circuit through a fluid sample injection valve. A processor is connected to the Raman spectrometer/flow cell, the pump, the permeation valve, the colloidal dispersion level sensor, and the fluid sample injection port.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: April 26, 2022
    Assignee: HORIBA INSTRUMENTS, INCORPORATED
    Inventors: Timothy Michael Holt, Michelle N. Sestak
  • Patent number: 6262181
    Abstract: This invention relates to a process for generating a organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendant COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of a acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.
    Type: Grant
    Filed: December 22, 1999
    Date of Patent: July 17, 2001
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Nageshwer Rao Bantu, Donald Frank Perry, Jacqueline Marie Marshall, Timothy Michael Holt
  • Patent number: 6072006
    Abstract: This invention relates to a process for generating a organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendant COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of a acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.
    Type: Grant
    Filed: November 6, 1998
    Date of Patent: June 6, 2000
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Nageshwer Rao Bantu, Donald Frank Perry, Jacqueline Marie Marshall, Timothy Michael Holt