Patents by Inventor Timothy S. Barge

Timothy S. Barge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FINE LINE THICK FILM RESISTORS BY PHOTOLITHOGRAPHY
    Publication number: 20080278278
    Abstract: The present invention is directed to a thick film patterned resistor on a substrate and to a method of forming it. The method involves providing a substrate with opposed surfaces, where one surface is coated with a layer of a resistor composition. A photoresist is applied over the layer of the resistor composition, and a desired pattern in the photoresist is formed, where the pattern leaves certain regions of the resistor composition layer uncovered by the photoresist. The resistor composition layer which is uncovered by the photoresist is etched under conditions effective to leave a mass of loosely bound resistor particles at regions of the resistor composition which are not covered by photoresist. The mass of resistor particles is then removed from the substrate to produce a thick film patterned resistor on the substrate.
    Type: Application
    Filed: July 21, 2008
    Publication date: November 13, 2008
    Applicant: Micropen Technologies Corporation
    Inventors: Timothy S. BARGE, Franklyn M. COLLINS
  • Fine line thick film resistors by photolithography
    Patent number: 7224258
    Abstract: The present invention is directed to a thick film patterned resistor on a substrate and to a method of forming it. The method involves providing a substrate with opposed surfaces, where one surface is coated with a layer of a resistor composition. A photoresist is applied over the layer of the resistor composition, and a desired pattern in the photoresist is formed, where the pattern leaves certain regions of the resistor composition layer uncovered by the photoresist. The resistor composition layer which is uncovered by the photoresist is etched under conditions effective to leave a mass of loosely bound resistor particles at regions of the resistor composition which are not covered by photoresist. The mass of resistor particles is then removed from the substrate to produce a thick film patterned resistor on the substrate.
    Type: Grant
    Filed: September 27, 2004
    Date of Patent: May 29, 2007
    Assignee: OhmCraft, Inc.
    Inventors: Timothy S. Barge, Franklyn M. Collins