Patents by Inventor Tina Weichelt

Tina Weichelt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10101665
    Abstract: An illumination unit for lithographic exposure and a device for lithographic exposure are disclosed. In an embodiment the illumination unit includes a beam source, an electronically drivable beam deflection element for generating a temporally varying two-dimensional beam deflection, a collimation lens, a beam homogenizing element, a Fourier lens and a field lens.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: October 16, 2018
    Assignees: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., Friedrich-Schiller-Universität Jena
    Inventors: Uwe Detlef Zeitner, Tina Weichelt, Yannick Bourgin
  • Publication number: 20170068168
    Abstract: An illumination unit for lithographic exposure and a device for lithographic exposure are disclosed. In an embodiment the illumination unit includes a beam source, an electronically drivable beam deflection element for generating a temporally varying two-dimensional beam deflection, a collimation lens, a beam homogenizing element, a Fourier lens and a field lens.
    Type: Application
    Filed: September 7, 2016
    Publication date: March 9, 2017
    Inventors: Uwe Detlef Zeitner, Tina Weichelt, Yannick Bourgin