Abstract: A slurry analysis system (14) for estimating a first characteristic of a slurry (12) having a plurality of particles (18) suspended in a dispersion medium (20) can include a slurry filter (40) that filters the slurry (12); and a control system (26) that estimates the first characteristic of the slurry (12) using a flow rate of a filtrate (50) through the slurry filter (40) and a slurry filtration pressure of the slurry (12).

Abstract: A slurry analysis system (14) for estimating a first characteristic of a slurry (12) having a plurality of particles (18) suspended in a dispersion medium (20) can include a flow restriction assembly (40); a sensor assembly (43) that senses a sensed condition of the slurry (12) as it flows through the flow restriction assembly (40); and a control and analysis system (26) that estimates the first characteristic of the slurry (12) based on the sensed condition. Further, the control and analysis system (26) can select a selected clogging behavior using the sensed condition, and estimate the first characteristic based on the selected clogging behavior.

Abstract: A slurry analysis system (14) for estimating a first characteristic of a slurry (12) having a plurality of particles (18) suspended in a dispersion medium (20) can include a slurry filter (40) that filters the slurry (12); and a control system (26) that estimates the first characteristic of the slurry (12) using a flow rate of a filtrate (50) through the slurry filter (40) and a slurry filtration pressure of the slurry (12).

Abstract: Fluid synthesis system and corresponding method for synthesis of slurry containing abrasive particles. The system and method are configured to substantially segregate the abrasive particles passing through the filter, used at the filtering step of the process, from the sticky components that clog such filter prior to the filtering step of the synthesis process to achieve a sustaining filtration of the slurry as a result of which the filter remains substantially unclogged for the whole predetermined duration of the filtering process.

Abstract: A slurry analysis system (14) for estimating a first characteristic of a slurry (12) having a plurality of particles (18) suspended in a dispersion medium (20) can include a flow restriction assembly (40); a sensor assembly (43) that senses a sensed condition of the slurry (12) as it flows through the flow restriction assembly (40); and a control and analysis system (26) that estimates the first characteristic of the slurry (12) based on the sensed condition. Further, the control and analysis system (26) can select a selected clogging behavior using the sensed condition, and estimate the first characteristic based on the selected clogging behavior.

Abstract: Fluid synthesis system and corresponding method for synthesis of slurry containing abrasive particles. The system and method are configured to substantially segregate the abrasive particles passing through the filter, used at the filtering step of the process, from the sticky components that clog such filter prior to the filtering step of the synthesis process to achieve a sustaining filtration of the slurry as a result of which the filter remains substantially unclogged for the whole predetermined duration of the filtering process.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: Methods and apparatus for actively damping vibrations associated with a optical assembly of a photolithographic system are disclosed. According to one aspect of the present invention, an assembly that provides damping to a structure of a photolithographic apparatus that is subject to structural oscillations includes a counter mass, an active mechanism, an a controller. The active mechanism is coupled to the structure, supports the counter mass, and applies a force to the structure to counteract structural oscillations in the structure. The controller controls the force applied by the active mechanism on the structure, and utilizes information associated with movement of the structure to control the force.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a second mover (232) that are arranged in series. The stage base (202) supports the first stage (206), which moves relative to the stage base (202). The movers (231, 232) cooperate to move the second stage (208) relative to the first stage (206). The movers (231, 232) can include one or more attraction-only type actuators. The movers (231, 232) cooperate to move the second stage (208) along an axis that is substantially perpendicular to the guide surface (203). The stage assembly (220) can also include a second mover subassembly (216) that cooperates with the first mover subassembly (216) to move the second stage (208) with two or more degrees of freedom relative to the first stage (206). Further, the first mover (231) can directly move a portion of the second mover (232).

Abstract: A control system for a moving magnet type planar motor is disclosed that permits positioning with three degrees of freedom. Motor force ripple compensation is achievable with the control system, and cross coupling between translation forces and torque is substantially decreased.

Abstract: This invention provides a platform and stage support apparatus and method that isolates the platform from vibration and maintains platform position within an exposure apparatus while the stage is moved about. The apparatus includes a base, platform, stage, pneumatic and electromagnetic supports from the base to the stage, and a controller for positioning the platform in response to data from stage and platform position sensors and pneumatic support pressure sensors. The method includes using a model that provides a target pressure for each pneumatic support in response to an input stage location. The apparatus and method use the pneumatic supports to carry the majority of platform and stage weight, thus requiring less force from the electromagnetic supports to maintain a desired platform position.

Abstract: Methods and apparatus for damping out vibrations associated with a structure are disclosed. According to one aspect of the present invention, a structure includes a mass and a vibration damper. The mass has a first surface and a second surface, and is arranged to transfer vibratory energy. The vibration damper includes a force adjuster, as well as a first energy dissipator and a second energy dissipator. The vibration damper is positioned about the mass so that the first energy dissipator is in contact with the first surface and the second energy dissipator is in contact with the second surface. The first energy dissipator and the second energy dissipator absorb the vibratory energy transferred by the mass, while the force adjuster adjusts force on the first energy dissipator and force on the second energy dissipator. In one embodiment, the mass is a beam.

Abstract: In a stage assembly, for instance a fine stage using a pair of push-pull electro-magnetic actuators to move the stage back and forth along an axis, there is typically a sensor to determine the actual stage location. This sensor's home position must correspond to the actual stage position where the two opposed actuators are observed to exert forces of the same magnitude but opposing directions on this stage. Since the actuators depend on the sensor reading to exert their forces correctly, misalignment of the home position will decrease system performance. The calibration of this sensor is accomplished using actual system feedback signals, which are the currents drawn by the two opposed actuators, during run time conditions. The sensor is considered calibrated (meaning a virtual “null” position) when each of the two opposed actuators draws the same amount of current. If this is not the case a feedback process calibrates the sensor.

Abstract: A pair of complementary magnetic actuators controls a stage in a high-precision positioning instrument in a single coordinate direction. Additional pairs of complementary magnetic actuators can be used to provide control of the stage in other coordinate directions. A small current through the windings of both magnetic actuators provides a zero net force on the fine stage, thus maintaining the position of the fine stage. The small current used to control the fine stage minimizes the RMS power gain. By increasing the current in one magnetic actuator while decreasing the current in the other, a net force is generated for large accelerations of the stage. Control of the magnetic actuators is simplified by simultaneously increasing and decreasing the current through the windings of the complementary magnetic actuators prior to accelerating the stage. Additionally, a feedforward command can control the magnetic actuators to decrease the settling time of the system.

Abstract: A fine stage control system for use for instance in a semiconductor lithography machine, uses a pair of opposing (push-pull) E/I core actuators to move the stage with high precision along an axis. The paired actuators are coupled together mathematically in terms of their control characteristics and controlled as a single entity, thereby providing a more efficient control scheme and improved system performance.