Patents by Inventor Ting-Chun Liu

Ting-Chun Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240144568
    Abstract: Apparatuses, systems, and techniques are presented to generate digital content. In at least one embodiment, one or more neural networks are used to generate video information based at least in part upon voice information and a combination of image features and facial landmarks corresponding to one or more images of a person.
    Type: Application
    Filed: September 6, 2022
    Publication date: May 2, 2024
    Inventors: Siddharth Gururani, Arun Mallya, Ting-Chun Wang, Jose Rafael Valle da Costa, Ming-Yu Liu
  • Patent number: 11955026
    Abstract: A method, computer program product, and computer system for public speaking guidance is provided. A processor retrieves speaker data regarding a speech made by a user. A processor separates the speaker data into one or more speaker modalities. A processor extracts one or more speaker features from the speaker data for the one or more speaker modalities. A processor generates a performance classification based on the one or more speaker features. A processor sends to the user guidance regarding the speech based on the performance classification.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: April 9, 2024
    Assignee: International Business Machines Corporation
    Inventors: Cheng-Fang Lin, Ching-Chun Liu, Ting-Chieh Yu, Yu-Siang Chen, Ryan Young
  • Patent number: 11941841
    Abstract: A computer-implemented method according to one embodiment includes running an initial network on a plurality of images to detect actors pictured therein and body joints of the detected actors. The method further includes running fully-connected networks in parallel, one fully-connected network for each of the detected actors, to reconstruct complete three-dimensional poses of the actors. Sequential model fitting is performed on the plurality of images. The sequential model fitting is based on results of running the initial network and the fully-connected networks. The method further includes determining, based on the sequential model fitting, a locational position for a camera in which the camera has a view of a possible point of collision of two or more of the actors. The camera is instructed to be positioned in the locational position.
    Type: Grant
    Filed: September 22, 2021
    Date of Patent: March 26, 2024
    Assignee: International Business Machines Corporation
    Inventors: Yu-Siang Chen, Ching-Chun Liu, Ryan Young, Ting-Chieh Yu
  • Publication number: 20240095989
    Abstract: Apparatuses, systems, and techniques to generate a video using two or more images comprising objects to be included in the video. In at least one embodiment, objects are identified in two or more images using one or more neural networks, to generate a video to include the objects in the video.
    Type: Application
    Filed: September 15, 2022
    Publication date: March 21, 2024
    Inventors: Arun Mohanray Mallya, Ting-Chun Wang, Ming-Yu Liu
  • Patent number: 11934959
    Abstract: Apparatuses, systems, and techniques are presented to synthesize consistent images or video. In at least one embodiment, one or more neural networks are used to generate one or more second images based, at least in part, on one or more point cloud representations of one or more first images.
    Type: Grant
    Filed: June 1, 2020
    Date of Patent: March 19, 2024
    Assignee: NVIDIA CORPORATION
    Inventors: Arun Mallya, Ting-Chun Wang, Ming-Yu Liu, Karan Sapra
  • Patent number: 8765329
    Abstract: The present disclosure provides a photomask. The photomask includes a first integrated circuit (IC) feature formed on a substrate; and a second IC feature formed on the substrate and configured proximate to the first IC feature. The first and second IC features define a dense pattern having a first pattern density. The second IC feature is further extended from the dense pattern, forming an isolated pattern having a second pattern density less than the first pattern density. A transition region is defined from the dense pattern to the isolated pattern. The photomask further includes a sub-resolution rod (SRR) formed on the substrate, disposed in the transition region, and connected with the first IC feature.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: July 1, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jeng-Shiun Ho, Luke Lo, Ting-Chun Liu, Min-Hung Cheng, Jing-Wei Shih, Wen-Han Chu, Cheng-Cheng Kuo, Hua-Tai Lin, Tsai-Sheng Gau, Ru-Gun Liu, Yu-Hsiang Lin, Shang-Yu Huang
  • Publication number: 20120115073
    Abstract: The present disclosure provides a photomask. The photomask includes a first integrated circuit (IC) feature formed on a substrate; and a second IC feature formed on the substrate and configured proximate to the first IC feature. The first and second IC features define a dense pattern having a first pattern density. The second IC feature is further extended from the dense pattern, forming an isolated pattern having a second pattern density less than the first pattern density. A transition region is defined from the dense pattern to the isolated pattern. The photomask further includes a sub-resolution rod (SRR) formed on the substrate, disposed in the transition region, and connected with the first IC feature.
    Type: Application
    Filed: November 5, 2010
    Publication date: May 10, 2012
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jeng-Shiun Ho, Luke Lo, Ting-Chun Liu, Min-Hung Cheng, Jing-Wei Shih, Wen-Han Chu, Cheng-Cheng Kuo, Hua-Tai Lin, Tsai-Sheng Gau, Ru-Gun Liu, Yu-Hsiang Lin, Shang-Yu Huang
  • Patent number: 6573024
    Abstract: The present invention provides a novel ammonium salt of an organic acid. When the salt is used as a base additive for a chemically amplified resist, the environmental stability of the resist can be enhanced, and the T-top phenomenon can be effectively prevented. In addition, the line width change caused by acid diffusion can be prevented, and the E0 value of the resist can be decreased.
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: June 3, 2003
    Assignees: Industrial Technology Research Institute, Everlight Chemical Industrial Corporation
    Inventors: Sheng-Yueh Chang, Jian-Hong Chen, Ting-Chun Liu, Tzu-Yu Lin, Wen-Yuang Tsai
  • Publication number: 20020086234
    Abstract: The present invention provides a novel ammonium salt of an organic acid. When the salt is used as a base additive for a chemically amplified resist, the environmental stability of the resist can be enhanced, and the T-top phenomenon can be effectively prevented. In addition, the line width change caused by acid diffusion can be prevented, and the E0 value of the resist can be decreased.
    Type: Application
    Filed: March 9, 2001
    Publication date: July 4, 2002
    Inventors: Sheng-Yueh Chang, Jiam-Hong Chen, Ting-Chun Liu, Tzu-Yu Lin, Wen-Yuang Tsai
  • Patent number: 6380339
    Abstract: The present invention relates to a silicon-containing vinyl copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit with an acid-labile group, and a vinyl repeating unit with a silicon-containing group. The silicon-containing vinyl copolymer is suitable for use as a top layer resist in a bilayer resist system.
    Type: Grant
    Filed: December 27, 2000
    Date of Patent: April 30, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Mao-Ching Fang, Ming-Chia Tai, Jui-Fa Chang, Ting-Chun Liu, Tzu-Yu Lin
  • Publication number: 20020042485
    Abstract: The present invention relates to a silicon-containing vinyl copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit with an acid-labile group, and a vinyl repeating unit with a silicon-containing group. The silicon-containing vinyl copolymer is suitable for use as a top layer resist in a bilayer resist system.
    Type: Application
    Filed: December 27, 2000
    Publication date: April 11, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Mao-Ching Fang, Ming-Chia Tai, Jui-Fa Chang, Ting-Chun Liu, Tzu-Yu Lin
  • Patent number: 6303725
    Abstract: The present invention provides a cyclic dione polymer, which is a homopolymer or a copolymer of a cyclic dione monomer selected from those represented by formulae (I) and (II) wherein A and B may be the same or different and are independently selected from the group consisting of halogen, hydrogen, C3-20 cyclic or pericyclic alkyl, C1-20 linear and branched alkyl, C6-20 aryl, C7-20 arylalkyl, C7-20 alkylaryl, silyl, alkylsilyl, germyl, alkylgermyl, alkoxycarbonyl, acyl, and a heterocylic group; or, A and B are linked together to form a C3-20 saturated or unsaturated cyclic hydrocarbon group or a substituted or unsubstituted heterocyclic group; C is selected from the group consisting of oxygen, sulfur, —CH2—, and —SiH2—, wherein each R1 is independently selected from C1-20 alkyl and phenyl.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: October 16, 2001
    Assignees: Industrial Technology Research Institute, Everlight Chemical Industrial Corporation
    Inventors: Sheng-Yueh Chang, Bang-Chein Ho, Jian-Hong Chen, Ting-Chun Liu, Tzu-Yu Lin
  • Patent number: 6197476
    Abstract: The present invention provides a cyclic dione polymer, which is a homopolymer or a copolymer of a cyclic dione monomer selected from those represented by formulae (I) and (II) wherein A and B may be the same or different and are independently selected from the group consisting of halogen, hydrogen, C3-20 cyclic or pericyclic alkyl, C1-20 linear and branched alkyl, C6-20 aryl, C7-20 arylalkyl, C7-20 alkylaryl, silyl, alkylsilyl, germyl, alkylgermyl, alkoxycarbonyl, acyl, and a heterocylic group; or, A and B are linked together to form a C3-20 saturated or unsaturated cyclic hydrocarbon group or a substituted or unsubstituted heterocyclic group; C is selected from the group consisting of oxygen, sulfur, wherein each R1 is independently selected from C1-20 alkyl and phenyl.
    Type: Grant
    Filed: December 17, 1998
    Date of Patent: March 6, 2001
    Assignee: Industrial Technology Research Institute Everlight Chemical Industrial Corporation
    Inventors: Sheng-Yueh Chang, Bang-Chein Ho, Jian-Hong Chen, Ting-Chun Liu, Tzu-Yu Lin