Patents by Inventor Ting Hsu Hung

Ting Hsu Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPOSITION FOR POST CHEMICAL-MECHANICAL POLISHING CLEANING
    Publication number: 20120021961
    Abstract: The present invention relates to a composition for post chemical-mechanical polishing (CMP) cleaning. The composition is alkaline, which can remove azole-type corrosion inhibitors on the wafer surface after CMP. This composition can effectively remove azole compounds, increase wettability of the Cu surface, and significantly improve the defect removal after CMP.
    Type: Application
    Filed: January 6, 2010
    Publication date: January 26, 2012
    Applicant: BASF SE
    Inventors: Andreas Klipp, Ting Hsu Hung, Kuochen Su, Sheng-Hung Tu