Abstract: A solar cell module comprises: a cover glass, a glass substrate, an aluminum frame, and a filling material. The glass substrate of the solar cell module is formed in a size smaller than that of the cover glass, whereas the cover glass is arranged above the glass substrate while spacing from the same by a first distance; the space ranged between the perimeter of the cover glass and the perimeter of the glass substrate is filled by the filling material while allowing the cross section of the filling material to be an acute triangle. Moreover, the bottom of the filling material is engaged with a contact end of a lower tongue piece of the aluminum frame that is disposed away from a sidewall of the aluminum frame by a contact point while allowing the contact point to be spaced from the perimeter of the glass substrate by a second distance.

Abstract: A surface treatment apparatus, disposed around a conveying device conveying a substrate in a predetermined conveying direction, includes: first and second liquid nozzles, disposed at an adjustable angle above the conveying device, each having an axial direction perpendicular to an axial direction of the conveying device, in which the second liquid nozzle is spaced apart from the first liquid nozzle by a first predetermined distance in the predetermined conveying direction, and the first and second liquid nozzles incline at a first angle facing each other; and first and second liquid level baffles, disposed on two sides of the conveying device respectively and spaced apart from the conveying device by a gap, in which the first and second liquid level baffles are located within the first predetermined distance spaced apart between the first and second liquid nozzles.

Abstract: A low-pressure process apparatus for processing a substrate comprises a base, a stage, a housing and at least one first roller set. The stage is disposed on the base for supporting the substrate. The housing is detachably disposed on the base moving between a first position and a second position, wherein when the housing is in a first position, the housing and the base form a chamber to receive the stage. When the housing is detached, the first roller set contacts and supports the housing to facilitate movement thereof in a first horizontal direction.

Abstract: A low-pressure process apparatus for processing a substrate comprises a base, a stage, a housing and at least one first roller set. The stage is disposed on the base for supporting the substrate. The housing is detachably disposed on the base moving between a first position and a second position, wherein when the housing is in a first position, the housing and the base form a chamber to receive the stage. When the housing is detached, the first roller set contacts and supports the housing to facilitate movement thereof in a first horizontal direction.

Abstract: This invention relates to a heat dissipation device for portable computer. The heat dissipation device comprises: a housing including at least one fan casing and at least one duct, said fan casing having an air suction opening which communicates with said duct, at least one air outlet communicating with said fan casing being provided at the front end of said housing, at least one air inlet communicating with said fan casing being provided at the rear end of said housing; and at least one side-blow fan provided within the fan casing, the air suction face of the side-blow fan being opposite to the air suction opening, the air introducing from the air inlet into the duct passes being sucked by the side-blow fan into the fan casing after passing through the air suction opening and blowing out through the air outlet. In this manner, excellent heat dissipation effect collocating with the use of a portable computer can be obtained. In addition, noise generation is effectively prevented.

Abstract: A detection apparatus for detecting a defect in an array of a liquid crystal display, comprises a main chamber, a stage, a detection device and a main heater. The stage is disposed in the main chamber, and the array is placed on stage. The detection device is disposed in the main chamber and detects an electrical characteristic of the array. The main heater heats the array to a first temperature to reveal the defect of the array.

Abstract: A low-pressure process apparatus for processing a substrate includes a chamber, a carrier and an exhaust module. The carrier is disposed in the chamber supporting the substrate. The exhaust module includes a first exhaust unit and a second exhaust unit. The first exhaust unit includes a plurality of first exhaust openings. The second exhaust unit includes a plurality of second exhaust openings. The second exhaust openings surround the first exhaust openings. The first and second exhaust openings are located in the chamber, and air in the chamber is exhausted through the first and second exhaust openings at substantially the same exhaust pressure, thereby decreasing air pressure therein.

Abstract: A device for transporting a housing of a low-pressure process apparatus comprises a first air actuator, a second air actuator, at least one first sliding element, at least one second sliding element, a supporting structure and at least one connecting element. The first sliding element is disposed on the first air actuator. The second sliding element is disposed on the second air actuator. The supporting structure is disposed between the first and second air actuators. The connecting element is disposed on the supporting structure connecting to the housing.

Abstract: A low-pressure process apparatus for processing a substrate comprises a base, a stage a housing and at least one first roller set. The stage is disposed on the base for supporting the substrate. The housing is detachably disposed on the base moving between a first position and a second position, wherein when the housing is in a first position, the housing and the base form a chamber to receive the stage. When the housing is detached, the first roller set contacts and supports the housing to facilitate movement thereof in a first horizontal direction.

Abstract: A detection apparatus for detecting a defect in an array of a liquid crystal display, comprises a main chamber, a stage, a detection device and a main heater. The stage is disposed in the main chamber, and the array is placed on stage. The detection device is disposed in the main chamber and detects an electrical characteristic of the array. The main heater heats the array to a first temperature to reveal the defect of the array.

Abstract: A method for fabricating a high aperture ratio and low contact resistance, TFT structure and devices formed by such method are disclosed. In the method, a source/drain metal layer is deposited directly on a n+ amorphous silicon layer such that the contact resistance of the transistor structure can be significantly reduced. The final deposition of a transparent electrode layer, such as of an ITO material, improves the aperture ratio for the transistor. Numerous other processing benefits are also provided by the present invention novel method such that a more reliable transistor and a capacitor that has more stable storage capacitance can be formed with the transistor. A back channel etched inverted staggered type TFT that has high aperture ratio and low contact resistance is thus provided by the present invention novel method.

Abstract: A method for manufacturing TFT (Thin Film Transistor) panel with high transmittance includes an intermediate-layer process. After the intermediate-layer process has been executed, the TFT panel is etched to remove the silicon nitride layer without coverage of the source conductive pattern and the drain conductive pattern. The transmittance of the portion of the TFT without shield of the source conductive pattern and the drain conductive pattern is thus higher than that of the portion of the TFT with the shield of the source conductive pattern and the drain conductive pattern. The intermediate-layer process in the preferred embodiment of the present invention has three aspects. In the first aspect, the first step is to bake the TFT panel. The second step is to form the contact hole in the insulating layer of the TFT panel. The third step is to form the source conductive pattern and the drain conductive pattern.