Patents by Inventor Ting-Jui WU

Ting-Jui WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9908779
    Abstract: A method and apparatus for treating graphene raw material by plasma, and an application thereof are provided. After treated by the plasma, the graphene raw material will have a special structure and characteristic.
    Type: Grant
    Filed: April 30, 2015
    Date of Patent: March 6, 2018
    Assignee: NATIONAL TAIWAN UNIVERSITY
    Inventors: I-Chun Cheng, Jian-Zhang Chen, Cheng-Che Hsu, Pi-Tai Chou, Hsiao-Wei Liu, Haoming Chang, Sheng-Ping Liang, Ting-Jui Wu
  • Publication number: 20160357108
    Abstract: A photoconductive layer with electrical property adjustable via control of intensity or location of illumination by a light source is provided. The photoconductive layer has at least one charge generation material and at least one binder for distributing the charge generation material within the body of the layer. The localized change of electrical property in the photoconductive layer arises on and beneath the surface area of the layer illuminated by the light source via actuated bulk change in electrical charge contributed by the charge generation material in the area.
    Type: Application
    Filed: December 7, 2015
    Publication date: December 8, 2016
    Inventors: Yu-Hsiang HSU, Jen Tau Gu, Shih-Jue LIN, Hsin-Hu WANG, Ting-Jui WU, I-Chun CHENG, Cheng-che HSU, Jian-Zhang CHEN, Tsun-Hsu CHEN, Chih-Kung LEE
  • Publication number: 20150322573
    Abstract: Method for preparing metal from metal precursor solution and the application thereof are provided. The metal precursor solution is treated by atmospheric pressure plasma jet (APPJ) and therefore transform into the metal.
    Type: Application
    Filed: December 5, 2014
    Publication date: November 12, 2015
    Inventors: I-Chun Cheng, Jian-Zhang Chen, Cheng-Che Hsu, Haoming Chang, Hsiao-Wei Liu, Chia-Yun Chou, Ting-Jui Wu
  • Publication number: 20150315026
    Abstract: A method and apparatus for treating graphene raw material by plasma, and an application thereof are provided. After treated by the plasma, the graphene raw material will have a special structure and characteristic.
    Type: Application
    Filed: April 30, 2015
    Publication date: November 5, 2015
    Inventors: I-Chun CHENG, Jian-Zhang CHEN, Cheng-Che HSU, Pi-Tai CHOU, Hsiao-Wei LIU, Haoming CHANG, Sheng-Ping LIANG, Ting-Jui WU