Abstract: Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes two dies, an encapsulant, a first metal line and a plurality of dummy vias. The encapsulant is disposed between the two dies. The first metal line is disposed over the two dies and the encapsulant, and electrically connected to the two dies. The plurality of dummy vias is disposed over the encapsulant and aside the first metal line.

Abstract: Disclosed herein is a foamable composition including a polymer component, a foaming agent, a crosslinking agent, a filler, and a recovered silicon sludge containing silicon carbide and silicon. The polymer component is present in an amount ranging from 15 wt % to 60 wt % based on a total weight of the foamable composition. A foamed material prepared from the foamable composition and a composite product including the same are also disclosed.

Abstract: A method of manufacturing a semiconductor device includes implanting a channel region of a first transistor and a channel region of a second transistor to have a first conductivity type. The method further includes forming source/drain regions of the first transistor to have the first conductivity type and source/drain regions of the second transistor to have a second conductivity type, wherein the second conductivity is different from the first conductivity type. The method further includes depositing a first work function layer over the channel region of the first transistor. The method further includes depositing a second work function layer over the channel region of the second transistor, wherein the first work function layer includes a same material as the second work function layer.

Abstract: A semiconductor device includes a substrate, a first transistor on the substrate, and a second transistor on the substrate. The first transistor has a first threshold voltage, and a channel region and source/drain regions of the first transistor are N-type. The second transistor has a second threshold voltage, a channel region of the second transistor is N-type and source/drain regions of the second transistor are P-type, and an absolute value of the first threshold voltage is substantially equal to an absolute value of the second threshold voltage.

Abstract: A method for establishing an aging model of a device is provided. The device is measured to obtain degradation information of the device under an operating condition, wherein the device is a physical device. The degradation information is partitioned into a permanent degradation portion and an impermanent degradation portion. The impermanent degradation portion is differentiated by time to obtain a differential value. The aging model is obtained according to the differential value. When the differential value is greater than zero, a degradation of the device increases over time, and when the differential value is less than zero, the degradation of the device decreases over time.

Abstract: A method for establishing an aging model of a device is provided. The device is measured to obtain degradation information of the device under an operating condition, wherein the device is a physical device. The degradation information is partitioned into a permanent degradation portion and an impermanent degradation portion. The impermanent degradation portion is differentiated by time to obtain a differential value. The aging model is obtained according to the differential value. When the differential value is greater than zero, a degradation of the device increases over time, and when the differential value is less than zero, the degradation of the device decreases over time.

Abstract: A chemical mechanical polishing (abbreviated as CMP) conditioner comprises a bottom substrate, an intermediate substrate and a diamond film The intermediate substrate is provided on the bottom substrate. The intermediate substrate comprises a hollow portion, an annular portion surrounding the hollow portion, and at least one projecting ring projecting out of the annular portion away from the bottom substrate. The projecting ring comprises a plurality of bumps arranged to be spaced apart from each other along an annulus region. The bumps are extended in a radial direction of the intermediate substrate. The diamond film is provided on the intermediate substrate. The diamond film is allowed for conforming to the bumps, so as to form a plurality of the abrasive projections.

Abstract: A semiconductor device includes a substrate, a first transistor on the substrate, and a second transistor on the substrate. The first transistor has a first threshold voltage, and a channel region and source/drain regions of the first transistor are N-type. The second transistor has a second threshold voltage, a channel region of the second transistor is N-type and source/drain regions of the second transistor are P-type, and an absolute value of the first threshold voltage is substantially equal to an absolute value of the second threshold voltage.

Abstract: An integrated circuit (IC) and a method for operating the IC are provided. The IC comprises a device under test and a first heater. The first heater is located at a first side of the device and provides heat to control a temperature of the device. The first heater comprises a semiconductor device having a first doped region and a second doped region having a conductivity type opposite to that of the first doped region, the first doped region interfacing with the second doped region.

Abstract: A chemical mechanical polishing (abbreviated as CMP) conditioner comprises a bottom substrate, an intermediate substrate and a diamond film The intermediate substrate is provided on the bottom substrate. The intermediate substrate comprises a hollow portion, an annular portion surrounding the hollow portion, and at least one projecting ring projecting out of the annular portion away from the bottom substrate. The projecting ring comprises a plurality of bumps arranged to be spaced apart from each other along an annulus region. The bumps are extended in a radial direction of the intermediate substrate. The diamond film is provided on the intermediate substrate. The diamond film is allowed for conforming to the bumps, so as to form a plurality of the abrasive projections.

Abstract: An integrated circuit (IC) and a method for operating the IC are provided. The IC comprises a device under test and a first heater. The first heater is located at a first side of the device and provides heat to control a temperature of the device. The first heater comprises a semiconductor device having a first doped region and a second doped region having a conductivity type opposite to that of the first doped region, the first doped region interfacing with the second doped region.

Abstract: An elastic compound material includes an elastic texture layer, two water-tolerant adhesive layers respectively and securely attached to opposite sides of the elastic texture layer and two elastic surface layers respectively attached to one of the two water-tolerant adhesive layers. Each elastic surface layer has a breakage extension rate 450˜800%, hardness (shore 000) between 40˜80. The elastic surface layer has a thickness between 0.5˜5.0nm.

Abstract: An elastic composite material having breathing characteristics and a massaging effect includes a substrate made from a closed cell rubber foam and formed with through-holes and protrusions, and a fabric sheet bonded to the substrate. Each of the through-holes has first and second ends and a varied cross-section that diverges from the first end to the second end. The ratio of the cross-section area of the second end of each of the through-holes to the cross-section area of the first end of each of the through-holes ranges from 1.2 to 5.0. The ratio of the total cross-section area of the second ends of the through-holes to the surface area of a surface of the substrate is less than 30%. Each of the protrusions has a height ranging from 0.5 mm to 6 mm relative to the surface of the substrate.