Abstract: The disclosure provides high refractive index ceramic material nanoimprint lithography (NIL) gratings having a relatively lower amount of carbon compared to traditional NIL gratings, and methods of making and using thereof, and devices including such gratings. The ceramic material includes one or more of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or any combination or derivative thereof.

Abstract: Embodiments relate to a method of fabricating a nano-sized structure in a resin element by nanoimprint lithography (NIL). The method reduces adhesive failure during NIL demolding by inhibiting polymerization at the interface between the resin element and the template. The template includes a polymerization inhibiting compound. The method includes pressing the template onto the resin element (or the resin element onto the template) to form the nano-sized structure in the resin element. The method also including diffusing the polymerization inhibiting compound from the template to the resin element, e.g., by holding them together for a period of time. A layer of the polymerization inhibiting compound is therefore formed at an interface of the template and resin element. The polymerization inhibiting compound inhibits polymerization at the interface. After the diffusion, the resin element is cured. Then the template is removed from the resin element.

Abstract: A method is provided. The method includes providing an alignment structure at least partially defining a predetermined alignment pattern. The method also includes forming a solid crystal on the alignment structure. Crystal molecules of the solid crystal are aligned in the predetermined alignment pattern.

Abstract: An optical element is provided. The optical element includes a solid crystal including crystal molecules aligned in a predetermined alignment pattern at least partially defined by an alignment structure.

Abstract: A method of forming a voided polymer includes forming a polymerizable composition containing a polymer precursor and a solid templating agent, forming a coating of the polymerizable composition, processing the coating to form a cured polymer material having a solid phase in a plurality of defined regions, and removing at least a portion of the solid phase from the cured polymer material to form a voided polymer layer.

Abstract: An actuator assembly includes a primary electrode, a secondary electrode overlapping at least a portion of the primary electrode, and an electroactive polymer layer disposed between the primary electrode and the secondary electrode, where the electroactive polymer layer includes a non-vertical (e.g., sloped) sidewall with respect to a major surface of at least one of the electrodes. The electroactive polymer layer may be characterized by a non-axisymmetric shape with respect to an axis that is oriented orthogonal to an electrode major surface.

Abstract: Embodiments relate to a method of fabricating a nano-sized structure in a resin element by nanoimprint lithography (NIL). The method reduces adhesive failure during NIL demolding by inhibiting polymerization at the interface between the resin element and the template. The template includes a polymerization inhibiting compound. The method includes pressing the template onto the resin element (or the resin element onto the template) to form the nano-sized structure in the resin element. The method also including diffusing the polymerization inhibiting compound from the template to the resin element, e.g., by holding them together for a period of time. A layer of the polymerization inhibiting compound is therefore formed at an interface of the template and resin element. The polymerization inhibiting compound inhibits polymerization at the interface. After the diffusion, the resin element is cured. Then the template is removed from the resin element.

Abstract: Disclosed herein is a nanoimprint lithography (ML) precursor material comprising a base resin component having a first refractive index ranging from 1.45 to 1.80, and a nanoparticles component having a second refractive index greater than the first refractive index of the base resin component. According to certain embodiments, further disclosed herein are a cured NIL material made by curing the NIL precursor material, a NIL grating comprising the cured NIL material, an optical component comprising the NIL grating, and methods for forming the NIL grating and the optical component using a NIL process.

Abstract: Disclosed herein are materials for nanoimprinting lithography (NIL) and devices molded from the materials using NIL processes. According to certain aspects, an NIL material includes a mixture including a light-sensitive base resin and nanoparticles. The light-sensitive base resin is characterized by a first refractive index ranging from 1.58 to 1.77. The nanoparticles are characterized by a second refractive index greater than the first refractive index of the light-sensitive base resin. The mixture is curable to form a cured material characterized by a third refractive index greater than 1.78. The nanoparticles include from 45 wt. % to 90 wt. % of the cured material.