Abstract: In the method for optical monitoring and/or determination of properties on samples, monochromatic electromagnetic radiation with a predetermined wavelength is sequentially directed from several radiation sources onto a sample influenced by an electronic evaluation unit. The respective intensity specific to the wavelength of the electromagnetic radiation scattered and/or reflected by the sample is detected by at least one detector and fed to the electronic evaluation unit for spectrally resolved evaluation in order to use it to monitor and/or determine properties of the respective sample.

Abstract: In the method for optical monitoring and/or determination of properties on samples, monochromatic electromagnetic radiation with a predetermined wavelength is sequentially directed from several radiation sources onto a sample influenced by an electronic evaluation unit. The respective intensity specific to the wavelength of the electromagnetic radiation scattered and/or reflected by the sample is detected by at least one detector and fed to the electronic evaluation unit for spectrally resolved evaluation in order to use it to monitor and/or determine properties of the respective sample.

Abstract: The present invention relates to an arrangement and to a method for wavefront analysis comprising a radiation source (8) that emits an electromagnetic wavefront of electromagnetic radiation (1) to be analyzed; a spatially resolving detector unit (4, 4a, 4b, 4c) for detecting the electromagnetic wavefront; and an electronic evaluation unit (5, 7) connected to the detector unit (4, 4a, 4b, 4c). The at least one beam guidance unit (3) for guiding the electromagnetic radiation (1), that is only diffractive and/or reflective, has at least one opening (3a, 3b, 3c) and the detector unit (4, 4a, 4b, 4c) is arranged behind the at least one opening (3a, 3b, 3c) of the beam guidance unit (3) in the direction of propagation of the electromagnetic radiation (1) for detecting a diffraction pattern of the electromagnetic radiation (1) diffracted at the at least one opening (3a, 3b, 3c).

Abstract: The present invention relates to an arrangement and to a method for wavefront analysis comprising a radiation source (8) that emits an electromagnetic wavefront of electromagnetic radiation (1) to be analyzed; a spatially resolving detector unit (4, 4a, 4b, 4c) for detecting the electromagnetic wavefront; and an electronic evaluation unit (5, 7) connected to the detector unit (4, 4a, 4b, 4c). The at least one beam guidance unit (3) for guiding the electromagnetic radiation (1), that is only diffractive and/or reflective, has at least one opening (3a, 3b, 3c) and the detector unit (4, 4a, 4b, 4c) is arranged behind the at least one opening (3a, 3b, 3c) of the beam guidance unit (3) in the direction of propagation of the electromagnetic radiation (1) for detecting a diffraction pattern of the electromagnetic radiation (1) diffracted at the at least one opening (3a, 3b, 3c).