Patents by Inventor Tobias Bauert

Tobias Bauert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microfluidic device and method for manufacturing a microfluidic device
    Patent number: 11607683
    Abstract: A method for manufacturing a microfluidic device includes providing a first substrate having a first surface and a second surface located opposite the first surface. An etching mask is produced on the first surface, the etching mask having an opening. A recess is produced by etching in the first surface in a region of the opening. An electrically conductive material is deposited on the etching mask and/or a layer covering the etching mask, and on a region of a bottom of the recess below the opening.
    Type: Grant
    Filed: November 16, 2020
    Date of Patent: March 21, 2023
    Assignee: IMT MASKEN UND TEILUNGEN AG
    Inventors: Tobias Bauert, Daniel Grogg
  • FLUID LINE PART FOR A MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND METHOD FOR PRODUCING A MICROFLUIDIC DEVICE
    Publication number: 20220250059
    Abstract: A fluid line part for a microfluidic device includes a first substrate having a first surface in which at least one depression is provided, the depression forming a channel for conducting a fluid along a main flow direction. At least one support web extends lengthwise inside the channel along the main flow direction. The support web is configured and positioned such that fluid flows freely around it.
    Type: Application
    Filed: May 13, 2020
    Publication date: August 11, 2022
    Inventors: Tobias BAUERT, Anke SANZ-VELASCO
  • MICROFLUIDIC DEVICE AND METHOD FOR MANUFACTURING A MICROFLUIDIC DEVICE
    Publication number: 20210154660
    Abstract: A method for manufacturing a microfluidic device includes providing a first substrate having a first surface and a second surface located opposite the first surface. An etching mask is produced on the first surface, the etching mask having an opening. A recess is produced by etching in the first surface in a region of the opening. An electrically conductive material is deposited on the etching mask and/or a layer covering the etching mask, and on a region of a bottom of the recess below the opening.
    Type: Application
    Filed: November 16, 2020
    Publication date: May 27, 2021
    Inventors: Tobias Bauert, Daniel Grogg