Patents by Inventor Tobias Volkenandt

Tobias Volkenandt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for preparing a microscopic sample from a volume sample
    Patent number: 11935723
    Abstract: A method prepares a microsample from a volume sample using multiple particle beams. The method includes providing a volume sample in the microscope system, wherein the interior of the volume sample has a sample region of interest, and producing a macrolamella comprising the sample region of interest by removing sample material of the volume sample using one of the particle beams. The method also includes orienting the macrolamella relative to one of the particle beams, and removing sample material of the macrolamella via a beam so that the region of interest is exposed.
    Type: Grant
    Filed: November 9, 2021
    Date of Patent: March 19, 2024
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Fabian Perez Willard, Tobias Volkenandt
  • METHOD AND DEVICE FOR PREPARING A MICROSCOPIC SAMPLE FROM A VOLUME SAMPLE
    Publication number: 20220157560
    Abstract: A method prepares a microsample from a volume sample using multiple particle beams. The method includes providing a volume sample in the microscope system, wherein the interior of the volume sample has a sample region of interest, and producing a macrolamella comprising the sample region of interest by removing sample material of the volume sample using one of the particle beams. The method also includes orienting the macrolamella relative to one of the particle beams, and removing sample material of the macrolamella via a beam so that the region of interest is exposed.
    Type: Application
    Filed: November 9, 2021
    Publication date: May 19, 2022
    Inventors: Fabian Perez Willard, Tobias Volkenandt
  • Charged particle beam system and method
    Patent number: 10854421
    Abstract: A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: December 1, 2020
    Assignees: Carl Zeiss Microscopy GmbH, Carl Zeiss Microscopy Ltd.
    Inventors: Daniela Donhauser, Christian Mueller, Barry Chamley, Tobias Volkenandt, Dirk Preikszas, Giuseppe Pavia, Heiko Stegmann
  • CHARGED PARTICLE BEAM SYSTEM AND METHOD
    Publication number: 20190304743
    Abstract: A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.
    Type: Application
    Filed: June 3, 2019
    Publication date: October 3, 2019
    Inventors: Daniela Donhauser, Christian Mueller, Barry Chamley, Tobias Volkenandt, Dirk Preikszas, Giuseppe Pavia, Heiko Stegmann