Patents by Inventor Todd A. Lopes

Todd A. Lopes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Halogen removal module and associated systems and methods
    Patent number: 10903065
    Abstract: A chamber is formed to enclose a processing region. A passageway is configured to provide for entry of a substrate into the processing region and removal of the substrate from the processing region. A substrate support structure is disposed within the processing region and configured to support the substrate within the processing region. At least one gas input is configured to supply one or more gases to the processing region. At least one gas output is configured to exhaust gases from the processing region. A humidity control device is configured to control a relative humidity within the processing region. At least one heating device is disposed to provide temperature control of the substrate within the processing region. The processing region of the chamber is directly accessible from a substrate handling module configured to operate at atmospheric pressure.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: January 26, 2021
    Assignee: Lam Research Corporation
    Inventors: Travis R. Taylor, Adam Bateman, Todd A. Lopes, Sankaranarayanan Ravi, Silvia Aguilar, Derek Witkowicki
  • Halogen Removal Module and Associated Systems and Methods
    Publication number: 20180330942
    Abstract: A chamber is formed to enclose a processing region. A passageway is configured to provide for entry of a substrate into the processing region and removal of the substrate from the processing region. A substrate support structure is disposed within the processing region and configured to support the substrate within the processing region. At least one gas input is configured to supply one or more gases to the processing region. At least one gas output is configured to exhaust gases from the processing region. A humidity control device is configured to control a relative humidity within the processing region. At least one heating device is disposed to provide temperature control of the substrate within the processing region. The processing region of the chamber is directly accessible from a substrate handling module configured to operate at atmospheric pressure.
    Type: Application
    Filed: May 12, 2017
    Publication date: November 15, 2018
    Inventors: Travis R. Taylor, Adam Bateman, Todd A. Lopes, Sankaranarayanan Ravi, Silvia Aguilar, Derek Witkowicki