Patents by Inventor Todd A. Luse
Todd A. Luse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200248307Abstract: A substrate carrier that supports a semiconductor substrate in a chemical vapor deposition system that includes a support having a beveled inner top surface including a top surface and a bottom surface. The top surface has a recessed area for receiving at least one substrate for chemical vapor deposition processing. The bottom surface has a beveled edge that forms a conical interface with the beveled inner top surface of the support at a self-locking angle that prevents substrate carrier movement in a vertical direction at a predetermined temperature equal to a maximum operation temperature. A coefficient of thermal expansion of a material forming the substrate carrier is substantially the same as a coefficient of thermal expansion of a material forming the support.Type: ApplicationFiled: January 26, 2020Publication date: August 6, 2020Applicant: Veeco Instruments, Inc.Inventors: Alexander I. Gurary, Sandeep Krishnan, Yuliy Rashkovsky, Todd Luse, Gaurab Samanta
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Patent number: 10718052Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.Type: GrantFiled: December 16, 2016Date of Patent: July 21, 2020Assignee: Veeco Instruments, Inc.Inventors: Louise S. Barriss, Richard A. Comunale, Roger P. Fremgen, Alexander I. Gurary, Todd A. Luse, Robert White Milgate, John D. Pollock
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Publication number: 20170096734Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shall so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.Type: ApplicationFiled: December 16, 2016Publication date: April 6, 2017Applicant: Veeco Instruments Inc.Inventors: Louise S. Barriss, Richard A. Comunale, Roger P. Fremgen, Alexander I. Gurary, Todd A. Luse, Robert White Milgate, John D. Pollock
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Patent number: 9230846Abstract: Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment. The platen and the wafer platforms rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms carried on the platen and carrying the wafers about a respective second axis of rotation and with a different angular velocity than the platen to create planetary motion therebetween.Type: GrantFiled: June 6, 2011Date of Patent: January 5, 2016Assignee: Veeco Instruments, Inc.Inventors: Adrian Celaru, Todd A. Luse, Ajit P. Paranjpe, Joseph Scandariato, Qingfu Tang
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Publication number: 20150361582Abstract: A gas flow flange includes a first and a second section. The first section includes a plurality of first gas channels positioned inside and parallel to a top surface. A plurality of second gas input channels are positioned perpendicular to the top surface and extending from the top surface to the bottom surface. Each of the plurality of first gas input channels are aligned with an output of a corresponding one of the plurality of first gas input channels. The second section includes a plurality of second gas input channels that are positioned perpendicular to and extending from the top surface to the bottom surface of the second section. Each of the plurality of second gas input channels are aligned with a corresponding one of the plurality of second gas input channels. Fluid cooling conduits are positioned perpendicular to the top surface of the second section.Type: ApplicationFiled: June 17, 2014Publication date: December 17, 2015Applicant: VEECO INSTRUMENTS, INC.Inventors: Todd A. Luse, Roger P. Fremgen
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Publication number: 20150075431Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.Type: ApplicationFiled: May 9, 2013Publication date: March 19, 2015Applicant: VEECO INSTRUMENTS INC.Inventors: Louise S. Barriss, Richard A. Comunale, Roger P. Fremgen, Alexander I. Gurary, Todd A. Luse, Robert White Milgate, III, John D. Pollock
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Publication number: 20120223048Abstract: An inline processing system for patterning magnetic recording layers on hard discs for use in a hard disc drive. Discs are processed on both sides simultaneously in a vertical orientation, in round plate-like holders called MDCs. A plurality (as many as 10) discs are held in a dial carrier of the MDC, and transferred from one process station to another. The dial carrier of the MDC may be rotated and/or angled at up to 70° from normal in each process station, so that one or a plurality of process sources may treat the discs simultaneously. This configuration provides time savings and a reduction in the number and size of process sources needed. A mask enhancement process for patterning of magnetic media, and a filling and planarizing process used therewith, are also disclosed.Type: ApplicationFiled: August 26, 2010Publication date: September 6, 2012Applicant: VEECO PROCESS EQUIPMENT INC.Inventors: Ajit Paranjpe, Todd A. Luse, Roger P. Fremgen, Narasimhan Srinivasan, Boris L. Druz, Katrina Rook, Adrian Celaru
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Publication number: 20110300297Abstract: Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment. The platen and the wafer platforms rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms carried on the platen and carrying the wafers about a respective second axis of rotation and with a different angular velocity than the platen to create planetary motion therebetween.Type: ApplicationFiled: June 6, 2011Publication date: December 8, 2011Applicant: VEECO INSTRUMENTS INC.Inventors: Adrian Celaru, Todd A. Luse, Ajit P. Paranjpe, Joseph Scandariato, Quinfu Tang
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Patent number: 7419421Abstract: A slider body characterized by rounded corners and edges and smooth surfaces, formed by polishing with a polymeric fiber and a free abrasive slurry of submicron particles.Type: GrantFiled: May 4, 2004Date of Patent: September 2, 2008Assignee: Seagate Technology LLCInventors: James R. Peterson, Todd A. Luse
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Publication number: 20050248884Abstract: A slider body characterized by rounded corners and edges and smooth surfaces, formed by polishing with a polymeric fiber and a free abrasive slurry of submicron particles.Type: ApplicationFiled: May 4, 2004Publication date: November 10, 2005Applicant: Seagate Technology LLCInventors: James Peterson, Todd Luse
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Patent number: 6486660Abstract: A head testing apparatus is provided for testing a data recording head. The apparatus includes a test volume, a magnetic field source, a holder and a thermoelectric source. The test volume is adapted to receive the head, and the magnetic field source is positioned to generate a magnetic field within the test volume. The holder is adapted to hold the head and position the head within the test volume. The thermoelectric source is positioned to contact the head when the head is positioned within the test volume by the holder.Type: GrantFiled: March 21, 2001Date of Patent: November 26, 2002Assignee: Seagate Technology LLCInventors: Todd A. Luse, James R. Peterson, Thien T. Tu