Patents by Inventor Todd C. Nielsen

Todd C. Nielsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus employing external light source for endpoint detection
    Patent number: 6509960
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: January 21, 2003
    Assignee: Micron Technology, Inc.
    Inventors: David R. Johnson, Joe Lee Phillip, Todd C. Nielsen, Robert J. Hatfield
  • Method and apparatus employing external light source for endpoint detection
    Patent number: 6429928
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Grant
    Filed: September 20, 1999
    Date of Patent: August 6, 2002
    Assignee: Micron Technology, Inc.
    Inventors: David R. Johnson, Joe Lee Phillips, Todd C. Nielsen, Robert J. Hatfield
  • METHOD AND APPARATUS EMPLOYING EXTERNAL LIGHT SOURCE FOR ENDPOINT DETECTION
    Publication number: 20010046043
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Application
    Filed: September 20, 1999
    Publication date: November 29, 2001
    Inventors: DAVID R. JOHNSON, JOE LEE PHILLIPS, TODD C. NIELSEN, ROBERT J. HATFIELD
  • Method and apparatus employing external light source for endpoint detection
    Publication number: 20010009459
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Application
    Filed: February 28, 2001
    Publication date: July 26, 2001
    Inventors: David R. Johnson, Joe Lee Phillip, Todd C. Nielsen, Robert J. Hatfield
  • Method and apparatus employing external light source for endpoint detection
    Patent number: 5969805
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: October 19, 1999
    Assignee: Micron Technology, Inc.
    Inventors: David R. Johnson, Joe Lee Phillips, Todd C. Nielsen, Robert J. Hatfield