Patents by Inventor Todd D. Hiar

Todd D. Hiar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REDUCED PITCH MULTIPLE EXPOSURE PROCESS
    Publication number: 20110244401
    Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
    Type: Application
    Filed: June 15, 2011
    Publication date: October 6, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Theodore A. PAXTON, Todd J. DAVIS, Todd D. HIAR, Cassandra May OWEN, Steven George HANSEN, James J. HUNTER
  • Reduced pitch multiple exposure process
    Patent number: 7981595
    Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
    Type: Grant
    Filed: July 11, 2005
    Date of Patent: July 19, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Theodore A. Paxton, Todd J. Davis, Todd D. Hiar, Cassandra May Owen, Steven George Hansen, James J. Hunter
  • Reduced pitch multiple exposure process
    Patent number: 7906270
    Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: March 15, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Theodore A Paxton, Todd J Davis, Todd D. Hiar, Cassandra May Owen, Steven George Hansen
  • Lithographic attribute enhancement
    Patent number: 7738075
    Abstract: A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Todd D. Hiar, Theodore A. Paxton, Todd J. Davis, Cassandra M. Owen