Patents by Inventor Todd L. Biggs

Todd L. Biggs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7665399
    Abstract: A system to imprint patterns on impressionable materials by generating a pressure differential within an imprinting chamber by creating a substantial vacuum in an imprinting area is provided. This system can be used to create conductive traces in a substrate onto which integrated circuit chips and dies can be mounted to create semiconductor packages. A low pressure line evacuates air from a material receiving area of a vessel creating a pressure differential across pistons in the vessel to thereby causing the pistons to press microtools into impressionable material layers. The low pressure line helps the microtools conform to any thickness variations in the imprinted material and prevents air pockets from developing between the microtool and the imprinted material.
    Type: Grant
    Filed: May 6, 2008
    Date of Patent: February 23, 2010
    Assignee: INTEL Corporation
    Inventors: Todd L. Biggs, Jeff R. Wienrich
  • Publication number: 20080202363
    Abstract: A system to imprint patterns on impressionable materials by generating a pressure differential within an imprinting chamber by creating a substantial vacuum in an imprinting area is provided. This system can be used to create conductive traces in a substrate onto which integrated circuit chips and dies can be mounted to create semiconductor packages. A low pressure line evacuates air from a material receiving area of a vessel creating a pressure differential across pistons in the vessel to thereby causing the pistons to press microtools into impressionable material layers. The low pressure line helps the microtools conform to any thickness variations in the imprinted material and prevents air pockets from developing between the microtool and the imprinted material.
    Type: Application
    Filed: May 6, 2008
    Publication date: August 28, 2008
    Applicant: Intel Corporation
    Inventors: Todd L. Biggs, Jeff R. Wienrich
  • Patent number: 7383769
    Abstract: A system to imprint patterns on impressionable materials by generating a pressure differential within an imprinting chamber by creating a substantial vacuum in an imprinting area is provided. This system can be used to create conductive traces in a substrate onto which integrated circuit chips and dies can be mounted to create semiconductor packages. A low pressure line evacuates air from a material receiving area of a vessel creating a pressure differential across pistons in the vessel thereby causing the pistons to press microtools into impressionable material layers. The low pressure line helps the microtools conform to any thickness variations in the imprinted material and prevents air pockets from developing between the microtool and the imprinted material.
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: June 10, 2008
    Assignee: Intel Corporation
    Inventors: Todd L. Biggs, Jeff R. Wienrich
  • Patent number: 7162810
    Abstract: A micro tool alignment apparatus and method of use is described herein. The micro tool alignment apparatus coarsely aligns multiple imprinting micro tools to one another and includes a plurality of attachment features to facilitate attachment of the micro tool(s) to the alignment apparatus and to facilitate positioning of the micro tool(s) according to a first and a second degree of freedom. Alignment features associated with the micro tool alignment apparatus further facilitate positioning of the micro tool according to a third degree of freedom.
    Type: Grant
    Filed: August 11, 2004
    Date of Patent: January 16, 2007
    Assignee: Intel Corporation
    Inventors: Todd L. Biggs, Jeff R. Wienrich