Abstract: An alignment fixture for a reactor system may comprise a fixture body comprising an inner perimeter at least partially defining a shape which comprises an inner space of the fixture body, wherein the inner space is configured to receive a susceptor of a reactor system; and/or a measuring protrusion coupled to the fixture body at a first position and protruding from the fixture body toward the inner space. The measuring protrusion may comprise an indicator between the fixture body and a measuring protrusion end of the measuring protrusion.

Abstract: An apparatus is disclosed for adaptive switch driving. In an example aspect, the apparatus includes a switching circuit configured to selectively be in a first state that provides an input voltage as an output voltage, be in a second state that provides a ground voltage as the output voltage, or be in a third state that causes the output voltage to change from the input voltage to the ground voltage according to a slew rate. The third state enables the switching circuit to transition from the first state to the second state. The switching circuit is also configured to adjust the slew rate of the output voltage for the third state responsive to at least one of the following: a change in a magnitude of a direct-current supply voltage or a change in a magnitude of an input current.

Abstract: Various embodiments of the present technology may provide a susceptor assembly. The susceptor assembly may include a susceptor plate and a cap disposed on a surface of the susceptor plate. The cap may have electrodes embedded within it. The susceptor plate may have heating elements embedded within it. The cap may be separated from the susceptor plate by an air gap formed by a plurality of dielectric spacers. The plurality of dielectric spacers may be sized for minimal contact on the cap.

Abstract: Various examples of the present disclosure relate to methods, systems, and apparatus for coupling a delivery vessel disposed at a first location on a substrate processing platform to a remote refill vessel disposed in a second location remote from the substrate processing platform, storing a chemical in the remote refill vessel in a first phase, changing the chemical in the remote refill vessel to a second phase, transporting the chemical in the second phase, to the delivery vessel, maintaining a temperature gradient within an inner volume of the delivery vessel, and returning the chemical to the first phase within the inner volume.

Abstract: Methods for depositing a film on a surface of substrate by cyclical deposition methods including pulsed purge processed are disclosed. The pulsed purge processes include introducing a purge gas into a reaction chamber at a first flow rate, and introducing a purge gas into the reaction chamber at second flow rate, the first flow rate being different to the second flow rate.

Abstract: The current disclosure relates to example method, system and apparatus for coupling a delivery vessel disposed at a first location on a substrate processing platform to a remote refill vessel disposed in a second location remote from the substrate processing platform via a first chemical delivery line, storing a chemical in the remote refill vessel in a first phase, changing the chemical in the remote refill vessel to a second phase, transporting the chemical in the second phase, to the delivery vessel via the first chemical delivery line, heating the first chemical delivery line to a first temperature equal to or above a phase change temperature of the chemical, and coupling the delivery vessel to an accumulator via a second chemical delivery line.

Abstract: An exhaust baffle component for an aircraft starter includes a plurality of frames arranged with one another as a single component. At least one of the plurality of frames may include an attachment flange extending therefrom and defining a receiving aperture. Each frame of the plurality of frames may include one or more louvers stacked relative to one another and spaced from one another to define an air opening therebetween. The attachment flange may extend from the frame at a substantially central region of an upper portion of the frame to substantially align the receiving aperture with a starter aperture of a starter component to facilitate securement of the attachment flange to the starter component.

Abstract: A gate valve and method according to which a gate body extends within a valve cavity, a fluid bore extends through the gate body, and a passage extends from the fluid bore, through the gate body, and to the valve cavity. The valve cavity is pressurized with a lubricant to prevent, or at least resist, solid particles (e.g., sand, fines, debris, etc.) from entering the valve cavity. The valve cavity and the fluid bore are pressure balanced. In some embodiments, a flow valve, such as a check valve or one-way valve, is positioned within the passage.

Abstract: A susceptor assembly includes a heater pedestal and a cap coupled to the heater pedestal. The cap can include one or mor through holes to facilitate purging and/or reduce dead volumes associated with the susceptor assemblies. Reactor systems including such assemblies are also disclosed.

Abstract: Weighted lift pin constructions as disclosed may be used with a semiconductor fabrication processing apparatus. The weighted lift pin constructions comprise a lift pin and a weight element disposed along an end of the lift pin. The weight element is removably retained on the lift pin by a retaining element that may be a clip element, an O-ring element, and differently configured lift pin and weight element threaded sections. When the clip element or O-ring element used, the weight element includes a collar adjacent an end of an opening in the weight element to accommodate placement of the clip or O-ring element therein as retained on the lift pin to thereby maintain axial placement of the lift pin relative to the weight element. Such maintained axial placement may also be achieved by interference locked engagement between differently configured lift pin and weighted element threaded sections.

Abstract: A reactor system may comprise a reaction chamber enclosed by a chamber sidewall, and a susceptor disposed in the reaction chamber between a reaction space and a lower chamber space comprised in the reaction chamber. The susceptor may comprise a pin hole disposed through the susceptor such that the pin hole is in fluid communication with the reaction space and the lower chamber space, and such that the reaction space is in fluid communication with the lower chamber space. A lift pin may be disposed in the pin hole. The lift pin may comprise a pin body comprising a pin channel, defined by a pin channel surface, disposed in the pin body such that the reaction space is in fluid communication with the lower chamber space when the lift pin is disposed in the pin hole.

Abstract: The substrate processing system includes a delivery vessel having a first inner volume, disposed in a first location on a substrate processing platform, a remote refill vessel in fluid communication with the delivery vessel via a chemical delivery line, the remote refill vessel comprising a second inner volume greater than the first inner volume and disposed in a second location remote from the substrate processing platform, and a first heating device or a first pressurizing device, or a combination thereof, proximate the remote refill vessel, operable to heat or pressurize, or a combination thereof, a chemical disposed in the remote refill vessel sufficient to change a phase of the chemical from a first phase to a second phase.

Abstract: A precursor monitoring assembly for use in reactor systems to provide real-time and direct measurements of the availability of source materials from a source vessel. The assembly includes one or more force or load sensors, such as load cells, positioned between a bottom wall of an interior tray and an exterior wall (e.g., a base of a source vessel) and/or outside the source vessel. A signal conditioning element processes the output electrical signals from the sensors, then a controller processes the output signals from the signal conditioning components with a conversion factor, for example, to determine a current weight of source material stored in the source vessel. The controller uses this weight to calculate the amount of available source material or chemistry in the source vessel.

Abstract: Various embodiments of the present technology may provide a first vessel to contain a slurry of a solid precursor powder and an inert liquid, a second vessel to receive the slurry, evaporate the inert liquid, and sublimate the solid precursor powder a first time to form a vapor, a third vessel to recondense the vapor back into a solid state and sublimate the solid precursor a second time to form a vapor, and a reaction chamber to receive the vapor from the third vessel.

Abstract: Methods, apparatuses, devices, and optical components are described. One or more materials used in an optical system may be bonded together using a pulsed laser beam. The bonding process may include transmitting a pulsed laser to irradiate an interface between two components, which may include two optical components or an optical component and a mounting component. The pulsed laser may generate one or more bonding locations where the components are in relatively close contact with each other, which may secure the components together via at least partial melting of material at one or more surfaces of the components. In some examples, the pulsed laser may be scanned over the bonding locations some quantity of times and/or using a pattern to achieve the bond. In some aspects, one or more absorbing layers may be added to the components.

Abstract: Apparatus for mixing two or more gases prior to entering a reaction chamber, reactor systems including the apparatus, and methods of using the apparatus and systems are disclosed. The systems and methods as described herein can be used to, for example, pulse a mixture of two or more precursors to a reaction chamber.

Abstract: A laser alignment fixture for a reactor system may be used to align components of the reactor system to allow for a uniform deposition of a thin film onto a substrate. The laser alignment fixture may include: a lid assembly; and a plurality of laser and sensor assemblies. The laser alignment fixture may align at least: a flow control ring, a susceptor, and a side wall of the reactor system.

Abstract: Herein disclosed are systems and methods related to delivery systems using solid source chemical fill vessels. The delivery system can include a vapor deposition reactor, two or more fill vessels, of which one of more can be remote from the vapor deposition reactor. Each fill vessel is configured to hold solid source chemical reactant therein. An interconnect line or conduit can fluidly connect the vapor deposition reactor with one or more of the fill vessels. A line heater can heat at least a portion of the interconnect line to at least a minimum line temperature.

Abstract: An alignment apparatus for aligning components of an optical assembly include a chuck configured to support the optical assembly thereon, and an adjustable flexure assembly disposed around the chuck. The adjustable flexure assembly includes a plurality of flexures. The plurality of flexures are positioned relative to the chuck such that each of the plurality of flexures contact the optical assembly when the optical assembly is positioned on the chuck.

Abstract: A lift pin assembly includes a holder to engage and secure the lift pin and a bellow to actuate the lift pin and the holder linearly and vertically. The holder includes three pieces that connect together to secure the lift pin within the holder. The holder includes a first piece having a recessed area, a second piece that nests within the recessed area, and a third piece adjacent the first and second pieces. The second piece contains a threaded hole to receive and secure the lift pin and the third piece contains a through-hole that aligns with the threaded hole of the second piece.