Patents by Inventor Todd Yeh

Todd Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240108793
    Abstract: An embodiment includes a process for treating an abdominal aortic aneurysm (AAA) endoleak with a shape memory polymer (SMP) foam device. First, a bifurcated stent graft is placed within the aneurysm while a micro guidewire is positioned within the aneurysm for future catheter access. Second, after placing the iliac graft extension, a catheter is introduced over wire to deliver embolic foams. Third, embolic foams expand and conform to the aneurysm wall. Fourth, embolic foams create a stable thrombus to prevent endoleak formation by isolating peripheral vessels from the aneurysm volume.
    Type: Application
    Filed: December 8, 2023
    Publication date: April 4, 2024
    Inventors: Duncan J. Maitland, Todd L. Landsman, John Horn, Landon Nash, Chung Yeh
  • Publication number: 20050026069
    Abstract: A via-filling material improves a via-filling process in manufacturing multi-layered printed circuit boards. The via-filling material is capable of undergoing UV pre-cure and thermal post-cure step. Exposed to ultraviolet light, the via-filling material filled up the two ends of the via form solid barrier films so that the inside via-filling material will not flow out during a thermal post curing process due to an lower viscosity of said material. The dual-cure treatment resolves the problems of polishing, sagging and bubbling in the via-filling process and ensures the integrity of the filling material. As a result, the via-filling material with smooth surface and a solid inside without void or hole therein formed.
    Type: Application
    Filed: July 31, 2003
    Publication date: February 3, 2005
    Inventor: Todd Yeh
  • Publication number: 20030203994
    Abstract: The present invention relates to a solventless photo-sensitive thermosetting type of material, a method for manufacturing the same, and its use; wherein said solventless photo-sensitive thermosetting type of material mainly comprises an aqueous alkaline-developable photo-sensitive resin, unsaturated monomer(s), epoxy resin(s), photo initiator(s), and is manufactured through a ring-opening condensation reaction as an initiation step, which is characterized in that a photo-sensitive monomer containing an unsaturated bond is used to replace organic solvent(s) regularly used in conventional solder mask products.
    Type: Application
    Filed: April 26, 2002
    Publication date: October 30, 2003
    Inventors: Michael Chen, Todd Yeh