Abstract: An electrochromic element including: a first electrode; a second electrode disposed to face the first electrode with a gap between the first electrode and the second electrode; a first electrochromic layer disposed on or above the first electrode, including conductor or semiconductor nano-structures and an electrochromic compound; and an electrolyte layer including an electrolyte, disposed between the first electrochromic layer and the second electrode, wherein the electrochromic compound is a compound represented by General Formula 1, and an anion of the electrolyte is a monovalent anion having oxidation potential higher than reduction potential of a dication of General Formula 1 by 3.1 V or greater, where X? is a monovalent anion having oxidation potential higher than reduction potential of the dication of General Formula 1 by 3.

Abstract: Provided is an inorganic structure including a plurality of inorganic particles; and a binding part that covers a surface of each of the plurality of inorganic particles and binds each of the plurality of inorganic particles together. The binding part contains: an amorphous compound containing at least one of aluminum or titanium, oxygen, and one or more metallic elements; and a plurality of fine particles having an average particle size of 100 nm or less. The plurality of inorganic particles has an average particle size of 1 ?m or more, and the plurality of inorganic particles has a volume percentage of 30% or more.

Abstract: A manufacturing line including a plurality of processing sections disposed in a series for manufacturing multi-layered printed circuit boards by continuously conveying and processing boards through the plurality of processing sections, in which the plurality of processing sections have at least two specific processing sections for conducting a common type of processes, and the specific processing sections are disposed in a common area.

Abstract: A disclosure is made of a subterranean connecting method and a connecting apparatus therefor which are suitable for use when two shield machines are used to excavate a pair of tunnel sections from both ends of a tunnel, and the tunnel sections are connected to each other in mid course. During underground connection, it is important to secure sealing and water retarding with respect to soil and water pressure exerted by the ground in the vicinity of the connecting section. For this purpose, in the connecting apparatus, a penetration ring is arranged in one of the shield machines, and a penetration chamber in which the penetration ring is accommodated is arranged in the other shield machine. Both the both shield machines face each other with a slight gap remaining therebetween and, subsequently, the penetration ring is moved forward and penetrates into the penetration chamber of the mating shield machine. By this penetration, the area between both the shield machines are closed by the penetration ring.