Abstract: Disclosed is a treating apparatus capable of improving the throughput during successive processing of target objects without a bad influence on the target objects. The disclosed treating apparatus includes an extendable liquid treating mechanism, and a common handling unit for handling one target object and another target object in order. The treating apparatus includes a recipe producing unit for producing a recipe having a rinsing liquid treatment and a common handling. When one common handling for handling one target object by the common handling unit and another common handling for handling another target object by the common handling unit are temporally overlapped with each other, the recipe producing unit extends the extendable liquid treatment for another target object, and shifts another common handling to an extent that the extendable liquid treatment is extended, thereby avoiding the temporal overlapping of one common handling with another common handling.

Abstract: A substrate processing system includes a control section configured to control a series of transfer operations and preset to control operation of a container transfer apparatus, operation at a substrate access area, and operation of a substrate handling apparatus independently of each other. The control section includes a schedule creating portion configured to create a transfer schedule by individually adjusting operation timing of the container transfer apparatus, operation timing at the substrate access area, and operation timing of the substrate handling apparatus such that, in a state while a first lot of substrates are treated in the processing system, but the container transfer apparatus and the substrate access area are unoccupied, a container with a second lot of unprocessed substrates stored therein is transferred onto the substrate access area, thereby minimizing total transfer time.

Abstract: Disclosed is a treating apparatus capable of improving the throughput during successive processing of target objects without a bad influence on the target objects. The disclosed treating apparatus includes an extendable liquid treating mechanism, and a common handling unit for handling one target object and another target object in order. The treating apparatus includes a recipe producing unit for producing a recipe having a rinsing liquid treatment and a common handling. When one common handling for handling one target object by the common handling unit and another common handling for handling another target object by the common handling unit are temporally overlapped with each other, the recipe producing unit extends the extendable liquid treatment for another target object, and shifts another common handling to an extent that the extendable liquid treatment is extended, thereby avoiding the temporal overlapping of one common handling with another common handling.

Abstract: A substrate processing system includes a control section configured to control a series of transfer operations and preset to control operation of a container transfer apparatus, operation at a substrate access area, and operation of a substrate handling apparatus independently of each other. The control section includes a schedule creating portion configured to create a transfer schedule by individually adjusting operation timing of the container transfer apparatus, operation timing at the substrate access area, and operation timing of the substrate handling apparatus such that, in a state while a first lot of substrates are treated in the processing system, but the container transfer apparatus and the substrate access area are unoccupied, a container with a second lot of unprocessed substrates stored therein is transferred onto the substrate access area, thereby making total transfer time pertinent.