Abstract: A rotating electric machine according to an embodiment of the present invention includes a rotor; a stator; an insulator; and a coil. The rotor rotates about a first axis. The stator includes teeth projecting toward the rotor. The insulator is attached to each of the teeth. The coil is wound around the insulator. The insulator includes a pair of side surface portions that are mounted on the teeth to generate a biasing force against the teeth in a twisting direction with respect to a direction of the first axis.

Abstract: A synchronous-rectification-type switching regulator is disclosed that includes a first switching element; an inductor charged with a voltage input to an input terminal of the switching regulator by the switching of the first switching element; a second switching element for synchronous rectification performing switching so as to discharge the inductor; a control circuit part controlling the switching of the first switching element so that an output voltage from an output terminal of the switching regulator is a predetermined constant voltage, and to cause the second switching element to perform the switching inversely to the first switching element; and a reverse current prevention circuit part interrupting a current that flows into the second switching element by cutting off the connection of the second switching element so as to prevent generation of a reverse current that flows in the direction of the second switching element from the output terminal.

Abstract: A synchronous-rectification-type switching regulator is disclosed that includes a first switching element; an inductor charged with a voltage input to an input terminal of the switching regulator by the switching of the first switching element; a second switching element for synchronous rectification performing switching so as to discharge the inductor; a control circuit part controlling the switching of the first switching element so that an output voltage from an output terminal of the switching regulator is a predetermined constant voltage, and to cause the second switching element to perform the switching inversely to the first switching element; and a reverse current prevention circuit part interrupting a current that flows into the second switching element by cutting off the connection of the second switching element so as to prevent generation of a reverse current that flows in the direction of the second switching element from the output terminal.

Abstract: A semiconductor integrated circuit device having a metal thin-film resistance includes a lower insulation film formed over a semiconductor substrate via another lawyer, a metal interconnection pattern formed on the lower insulation film, an underlying insulation film formed on the lower insulation film and the metal interconnection pattern, and a contact hole formed in said underlying insulation film on the metal interconnection pattern, wherein the metal thin-film resistance is formed so as to extend from a top surface of the underlying insulation film to the contact hole in electrical contact with the metal interconnection pattern in the contact hole, at least a part of constituting elements of the semiconductor integrated circuit other than the metal thin-film resistance is disposed in a region underneath the metal thin-film resistance.

Abstract: A semiconductor integrated circuit device having a metal thin-film resistance includes a lower insulation film formed over a semiconductor substrate via another lawyer, a metal interconnection pattern formed on the lower insulation film, an underlying insulation film formed on the lower insulation film and the metal interconnection pattern, and a contact hole formed in said underlying insulation film on the metal interconnection pattern, wherein the metal thin-film resistance is formed so as to extend from a top surface of the underlying insulation film to the contact hole in electrical contact with the metal interconnection pattern in the contact hole, at least a part of constituting elements of the semiconductor integrated circuit other than the metal thin-film resistance is disposed in a region underneath the metal thin-film resistance.

Abstract: An image-forming apparatus using a rubber blade having a rubber hardness of not smaller than 73.degree. for cleaning the residual toner on the photosensitive material drum, wherein a maximum rotational deviation r (mm) of said photosensitive material drum satisfies the following formula,0.15.gtoreq.r.gtoreq.((a.multidot.sin .theta.).sup.2 +b.sup.2).sup.1/2 -bwhereina: length (mm) one-half of the blade length,b: radius (mm) of the drum,.theta.: angle subtended by a line of the drum surface in parallel with an imaginary center axis of the drum and by a tangential line of contact between the rubber blade and the photosensitive material drum.This apparatus exhibits excellent cleaning performance, permits the photosensitive layer to be evenly scraped over the whole surface of the photosensitive material drum and, hence, makes it possible to stably form image for extended periods of time.

Abstract: This invention relates to an image forming apparatus in which a cleaning device is arranged above a photosensitive drum close thereto. The image forming apparatus has an image processing unit provided with the photosensitive drum. The photosensitive drum is constructed such that a gear portion formed in a flange member at one axial end of the photosensitive drum has a diameter not greater than an outer diameter of the photosensitive drum. The image processing unit is constructed such that a driving force from the image forming apparatus is transmitted to the photosensitive drum via the gear portion formed in the one flange member to rotate the photosensitive drum and is transmitted to at least one of image processor means via a gear portion formed in a flange member at the opposite axial end of the photosensitive drum. With this arrangement, a poor image formation due to a blocking phenomenon resulting from long stay of toner residues can be prevented and downsizing of the image forming apparatus is realized.

Abstract: The photosensitive material of the present invention is provided in contact with a developing roller and has a surface potential decay characteristic in which when the photosensitive material is charged to a surface potential of 800 V and is contacted with the developing roller to which a voltage (VR) is applied, the surface potential (VD) of the photosensitive material after contacting is represented by the formula (1):VD.gtoreq.800.times.EXP (0.00235.times.VR).By using this photosensitive material, a transverse black stripe in the tip of the transfer paper is prevented and it is possible to form an image having excellent image quality and image density.

Abstract: A process for producing trifluoroacetic acid and trifluoroacetyl chloride from 1,1-dichloro-2,2,2-trifluoroethane, oxygen and water as starting materials, characterized in that the starting materials are reacted in a vapor phase in a reactor of perfect mixing type to avoid local heating, under a condition not to liquefy the starting materials and reaction products, while continuously supplying the starting materials and continuously withdrawing the reaction products, so as to obtain a reaction mixture comprising trifluoroacetyl chloride as the main product and trifluoroacetic acid as an accompanying product.

Abstract: In a process for producing methacrylic acid by two step oxidation comprising a first oxidation step of producing methacrolein by reacting isobutylene with molecular oxygen in the presence of a diluent gas and a catalyst, and a second oxidation step of producing methacrylic acid by reacting methacrolein with molecular oxygen in the presence of a diluent gas and a catalyst, the improvement comprises using nitrogen as the diluent gas in the first oxidation step and nitrogen and steam as the diluent gas in the second oxidation step, mixing the reaction products obtained in the first and second oxidation steps, separating and recovering methacrolein and methacrylic acid from the mixture and feeding the recovered methacrolein back into the second oxidation step as a starting material.