Patents by Inventor Tokiko Kaji

Tokiko Kaji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10078059
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Grant
    Filed: January 4, 2017
    Date of Patent: September 18, 2018
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Publication number: 20170115239
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Application
    Filed: January 4, 2017
    Publication date: April 27, 2017
    Inventors: Keiji ISHIBASHI, Tokiko KAJI, Seiji NAKAHATA, Takayuki NISHIURA
  • Patent number: 9570540
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Grant
    Filed: August 8, 2014
    Date of Patent: February 14, 2017
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Publication number: 20140349112
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Application
    Filed: August 8, 2014
    Publication date: November 27, 2014
    Inventors: Keiji ISHIBASHI, Tokiko KAJI, Seiji NAKAHATA, Takayuki NISHIURA
  • Patent number: 8828140
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Grant
    Filed: July 3, 2013
    Date of Patent: September 9, 2014
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Publication number: 20130292802
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Application
    Filed: July 3, 2013
    Publication date: November 7, 2013
    Inventors: Keiji ISHIBASHI, Tokiko KAJI, Seiji NAKAHATA, Takayuki NISHIURA
  • Patent number: 8192543
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Grant
    Filed: July 1, 2008
    Date of Patent: June 5, 2012
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Patent number: 7854804
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1-d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Grant
    Filed: July 1, 2008
    Date of Patent: December 21, 2010
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Publication number: 20100123168
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Application
    Filed: December 10, 2009
    Publication date: May 20, 2010
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Keiji ISHIBASHI, Tokiko KAJI, Seiji NAKAHATA, Takayuki NISHIURA
  • Publication number: 20080271667
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Application
    Filed: July 1, 2008
    Publication date: November 6, 2008
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Publication number: 20080272392
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Application
    Filed: July 1, 2008
    Publication date: November 6, 2008
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Patent number: 7416604
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Grant
    Filed: June 23, 2006
    Date of Patent: August 26, 2008
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura
  • Publication number: 20060292728
    Abstract: A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1?d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 ?m and the plane spacing d2 at the X-ray penetration depth of 5 ?m is equal to or lower than 2.1×10?3.
    Type: Application
    Filed: June 23, 2006
    Publication date: December 28, 2006
    Inventors: Keiji Ishibashi, Tokiko Kaji, Seiji Nakahata, Takayuki Nishiura