Abstract: The present invention provides an electron emission device assured to emit electrons without requiring film thickness control in the order of submicrons and production method of the electron emission device as well as a display apparatus using the electron emission device.

Abstract: The present invention provides an electron emission device assured to emit electrons without requiring film thickness control on the order of submicrons and a production method of the electron emission device as well as a display apparatus using the electron emission device. The electron emission device includes a cathode electrode consisting of conductive fine particles adhered directly onto a substrate and electrons are emitted from these conductive fine particles when a predetermined electric field is applied.

Abstract: A field emission cathode manufacturing method is provided which comprise the steps of forming a cathode electrode on a substrate; forming an insulative layer and gate electrode, each having fine holes formed therein, in this order on the cathode electrode; thereafter immersing them in a solution in which particles of an electron-emitting substance is dispersed; and electrically depositing particles of the electron emission substance on the cathode electrode facing the fine holes by an electrophoresis using the cathode electrode as a positive or negative electrode, thereby forming an electron emitter. The wet method is adopted to form the field emission cathode, which permits to considerably reduce the plant and equipment investment and manufacture even a large-screen FED with an improved yield. Also, since the electron missive substance particles are fully exposed, a very low accuracy is allowed in producing the electron emitter.