Patents by Inventor Tokio Hagiwara

Tokio Hagiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5576417
    Abstract: There is disclosed a method for producing aromatic polyamides represented by the following formula (III), which comprises reacting an aromatic dihalogen compound represented by the following formula (I) with a diamine compound represented by the following formula (II) in the presence of cobalt/phosphine complex and a basic substance under carbon monoxide atmosphere:X.sub.1 --Ar--X.sub.2 formula (I)wherein Ar represents an aromatic residue and X.sub.1 and X.sub.2 each represent a bromine or iodine atom,H.sub.2 N--R--NH.sub.2 formula (II)wherein R represents a divalent hydrocarbon group, andformula (III) ##STR1## wherein Ar and R each have the same meaning as the above, and n is a positive integer.
    Type: Grant
    Filed: September 13, 1994
    Date of Patent: November 19, 1996
    Assignee: Director-General of Agency of Industrial Science and Technology
    Inventors: Kazuhiko Takeuchi, Yoshihiro Kubota, Takaaki Hanaoka, Takehiko Matsuzaki, Yoshihiro Sugi, Tatsuya Eto, Tokio Hagiwara, Tadashi Narita
  • Patent number: 5308888
    Abstract: According to the present invention, there is provided a resin composition which can provide an insulating resin having excellent heat resistance and flame retardance after curing and showing a low dielectric constant.A fluorine-containing photo-setting resin composition comprising a polymer containing fluorine or a fluorine-containing group represented by general formula [II]: ##STR1## wherein R.sup.1 and R.sup.2 are selected from the group consisting of H, F, CH.sub.3 and CF.sub.3 ; R.sup.3 and R.sup.4 are selected from the group consisting of CH.sub.2 and CF.sub.2 ; x and y show 0 to 4 and m shows 30 to 1000, and a photopolymerization initiator, which is a solid at ambient temperature, melts between 100.degree. and 150.degree. C., has a melt viscosity of not greater than 10.sup.6 poise and is photocurable.
    Type: Grant
    Filed: February 22, 1993
    Date of Patent: May 3, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Shin Nishimura, Akira Nagai, Akio Takahashi, Akio Mukoo, Tadashi Narita, Tokio Hagiwara, Hiroshi Hamana, Junichi Katagiri
  • Patent number: 4613657
    Abstract: A methanol-insoluble homopolymer of an .alpha.-trifluoromethylacrylate, which has either an alkyl group or a fluorine-containing alkyl group in the ester radical, is formed at good yields in an organic aprotic solvent by using an alkali metal alkoxide, e.g. lithium t-butoxide, as anionic polymerization catalyst.
    Type: Grant
    Filed: February 6, 1986
    Date of Patent: September 23, 1986
    Assignee: Central Glass Company, Limited
    Inventors: Tadashi Narita, Tokio Hagiwara, Hiroshi Hamana